Your browser doesn't support javascript.
loading
Monolayer Vacancy-Induced MXene Memory for Write-Verify-Free Programming.
Tan, Dongchen; Sun, Nan; Huang, Jijie; Zhang, Zhaorui; Zeng, Lijun; Li, Qikun; Bi, Sheng; Bu, Jingyuan; Peng, Yan; Guo, Qinlei; Jiang, Chengming.
Afiliação
  • Tan D; Key Laboratory for Precision and Non-traditional Machining Technology of the Ministry of Education, Dalian University of Technology, Dalian, 116024, China.
  • Sun N; Key Laboratory for Precision and Non-traditional Machining Technology of the Ministry of Education, Dalian University of Technology, Dalian, 116024, China.
  • Huang J; School of Materials Engineering, Purdue University, West Lafayette, 47907, USA.
  • Zhang Z; Key Laboratory for Precision and Non-traditional Machining Technology of the Ministry of Education, Dalian University of Technology, Dalian, 116024, China.
  • Zeng L; Key Laboratory for Precision and Non-traditional Machining Technology of the Ministry of Education, Dalian University of Technology, Dalian, 116024, China.
  • Li Q; School of Advanced Materials and Nanotechnology, Xidian University, Xi'an, 710126, China.
  • Bi S; Key Laboratory for Precision and Non-traditional Machining Technology of the Ministry of Education, Dalian University of Technology, Dalian, 116024, China.
  • Bu J; Key Laboratory for Precision and Non-traditional Machining Technology of the Ministry of Education, Dalian University of Technology, Dalian, 116024, China.
  • Peng Y; Key Laboratory for Precision and Non-traditional Machining Technology of the Ministry of Education, Dalian University of Technology, Dalian, 116024, China.
  • Guo Q; Department of Material Science and Engineering, Frederick Seitz Material Research Laboratory, University of Illinois at Urbana-Champaign, Urbana, 61801, USA.
  • Jiang C; Key Laboratory for Precision and Non-traditional Machining Technology of the Ministry of Education, Dalian University of Technology, Dalian, 116024, China.
Small ; 20(36): e2402273, 2024 Sep.
Article em En | MEDLINE | ID: mdl-38682587
ABSTRACT
The fundamental logic states of 1 and 0 in Complementary Metal-Oxide-Semiconductor (CMOS) are essential for modern high-speed non-volatile solid-state memories. However, the accumulated storage signal in conventional physical components often leads to data distortion after multiple write operations. This necessitates a write-verify operation to ensure proper values within the 0/1 threshold ranges. In this work, a non-gradual switching memory with two distinct stable resistance levels is introduced, enabled by the asymmetric vertical structure of monolayer vacancy-induced oxidized Ti3C2Tx MXene for efficient carrier trapping and releasing. This non-cumulative resistance effect allows non-volatile memories to attain valid 0/1 logic levels through direct reprogramming, eliminating the need for a write-verify operation. The device exhibits superior performance characteristics, including short write/erase times (100 ns), a large switching ratio (≈3 × 104), long cyclic endurance (>104 cycles), extended retention (>4 × 106 s), and highly resistive stability (>104 continuous write operations). These findings present promising avenues for next-generation resistive memories, offering faster programming speed, exceptional write performance, and streamlined algorithms.
Palavras-chave

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Small Ano de publicação: 2024 Tipo de documento: Article

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Small Ano de publicação: 2024 Tipo de documento: Article