FePc and FePcF16 on Rutile TiO2(110) and (100): Influence of the Substrate Preparation on the Interaction Strength.

Interface properties of iron phthalocyanine (FePc) and perfluorinated iron phthalocyanine (FePcF16) on rutile TiO2(100) and TiO2(110) surfaces were studied using X-ray photoemission spectroscopy (XPS), X-ray absorption spectroscopy (XAS), and low-energy electron diffraction (LEED). It is demonstrated that the interaction strength at the interfaces is considerably affected by the detailed preparation procedure. Weak interactions were observed for all studied interfaces between FePc or FePcF16 and rutile, as long as the substrate was exposed to oxygen during the annealing steps of the preparation procedure. The absence of oxygen in the last annealing step only had almost no influence on interface properties. In contrast, repeated substrate cleaning cycles performed in the absence of oxygen resulted in a more reactive, defect-rich substrate surface. On such reactive surfaces, stronger interactions were observed, including the cleavage of some C-F bonds of FePcF16.

Interface properties of CoPc and CoPcF16 on graphene/nickel: influence of germanium intercalation.

Photoelectron spectroscopy was used to investigate electronic interface properties and interactions of the organic semiconductors CoPc and CoPcF16 on graphene/nickel based substrates. Additional focus was put on the influence of germanium intercalation of graphene/nickel. The presented results demonstrate that germanium can decouple graphene from nickel and in this manner restore its buffer layer properties. No charge transfer from the substrate to the organic layer is observed in the germanium intercalated case, while interface related peaks in the Co 2p core level spectra indicate such charge transfer on graphene/nickel. Strong interface dipoles are found for CoPcF16 on graphene/nickel and on germanium intercalated graphene/nickel. Fluorine Auger parameters have been measured, and the results provide evidence for polarization and charge transfer screening effects of different amounts at the unlike film-substrate interfaces. The various contributions to the observed shifts are discussed.