RESUMO
The monolayer grafting on the oxide-free Si surface is challenging due to vulnerability of the surface against oxide formation in an ambient atmosphere. Most of the conventional studies focused on organic solvent-based chemistry and solvent and substrate interfaces, and residual solvents after the monolayer grafting play a key role in producing the highly stable monolayers. CO2 in its supercritical state (SCCO2) provides an elegant engineering solution for the problem faced as it can be used as inert processing environment and as carrier fluid for monolayer grafting taking up the role of organic solvents. In this work, monolayers of alkyl organophosphonic acids (OPAs) and functional OPAs were grafted on hydrogen-terminated oxide-free Si surfaces using the SCCO2 process. Grafted monolayers were physically and chemically characterized to verify the successful monolayer formation and determine the nature of the covalent binding configuration on the surface. To broaden the prospects of practical utility of the process and the OPA monolayer, the (3-bromopropyl)phosphonic acid (BPPA) monolayer was demonstrated to undergo secondary functionalization by terminal group substitution to convert the Br terminal group to the OH terminal group and secondary monolayer grafting to assemble 4-fluorothiophenol on top of the BPPA monolayer. The ability of monolayers to sustain secondary functionalization processing qualitatively hints toward ordered and stable monolayers of OPAs. The developed SCCO2 process in this work presents a single-step, green, and scalable method to graft the OPA monolayer on oxide-free Si which can employed in the future for monolayer doping, highly selective biochemical sensors, and targeted biological interactions.
RESUMO
By utilizing nanoreactor-like structures, the immobilization of macromolecules such as calixarenes and cyclodextrins (CD) with bucket-like structures provides new possibilities for engineered surface-molecule systems. The practical use of any molecular system depends on the availability of a universal procedure for immobilizing molecules with torus-like structures on various surfaces while maintaining identical operating parameters. There are currently several steps, including toxic solvent-based approaches using modified ß-CD to covalently attach to surfaces with multistep reactions. However, the existing multistep process results in molecular orientation, restricts the accessibility of the hydrophobic barrel of ß-CD's for practical use, and is effectively unable to use the surfaces immobilized with ß-CD for a variety of applications. In this study, it was demonstrated that ß-CD attached to the oxide-based semiconductor and metal surfaces through a condensation reaction between the hydroxyl-terminated oxide-based semiconductor/metal oxide and ß-CD in supercritical carbon dioxide (SCCO2) as a medium. The primary benefit of SCCO2-assisted grafting of unmodified ß-CD on various oxide-based metal and semiconductor surfaces is that it is a simple, efficient, one-step process and that it is ligand-free, scalable, substrate-independent, and uses minimal energy. Various physical microscopy and chemical spectroscopic methods were used to analyze the grafted ß-CD oligomers. The application of the grafted ß-CD films was demonstrated by the immobilization of rhodamine B (RhB), a dye, and dopamine, a drug. The in situ nucleation and growth of silver nanoclusters (AgNCs) in the molecular systems were studied for antibacterial and tribological properties by utilizing the guest-host interaction ability of ß-CD.
RESUMO
Oxide-free silicon chemistry has been widely studied using wet-chemistry methods, but for emerging applications such as molecular electronics on silicon, nanowire-based sensors, and biochips, these methods may not be suitable as they can give rise to defects due to surface contamination, residual solvents, which in turn can affect the grafted monolayer devices for practical applications. Therefore, there is a need for a cleaner, reproducible, scalable, and environmentally benign monolayer grafting process. In this work, monolayers of alkylthiols were deposited on oxide-free semiconductor surfaces using supercritical carbon dioxide (SCCO2) as a carrier fluid owing to its favorable physical properties. The identity of grafted monolayers was monitored with Fourier transform infrared (FTIR) spectroscopy, high-resolution X-ray photoelectron spectroscopy (HRXPS), XPS, atomic force microscopy (AFM), contact angle measurements, and ellipsometry. Monolayers on oxide-free silicon were able to passivate the surface for more than 50 days (10 times than the conventional methods) without any oxide formation in ambient atmosphere. Application of the SCCO2 process was further extended by depositing alkylthiol monolayers on fragile and brittle 1D silicon nanowires (SiNWs) and 2D germanium substrates. With the recent interest in SiNWs for biological applications, the thiol-passivated oxide-free silicon nanowire surfaces were also studied for their biological response. Alkylthiol-functionalized SiNWs showed a significant decrease in cell proliferation owing to their superhydrophobicity combined with the rough surface morphology. Furthermore, tribological studies showed a sharp decrease in the coefficient of friction, which was found to be dependent on the alkyl chain length and surface bond. These studies can be used for the development of cost-effective and highly stable monolayers for practical applications such as solar cells, biosensors, molecular electronics, micro- and nano- electromechanical systems, antifouling agents, and drug delivery.
Assuntos
Dióxido de Carbono/química , Hidrogênio , Semicondutores , Silício , Compostos de Sulfidrila , Propriedades de SuperfícieRESUMO
Formation of dense monolayers with proven atmospheric stability using simple fabrication conditions remains a major challenge for potential applications such as (bio)sensors, solar cells, surfaces for growth of biological cells, and molecular, organic, and plastic electronics. Here, we demonstrate a single-step modification of organophosphonic acids (OPA) on 1D and 2D structures using supercritical carbon dioxide (SCCO2) as a processing medium, with high stability and significantly shorter processing times than those obtained by the conventional physisorption-chemisorption method (2.5 h vs 48-60 h).The advantages of this approach in terms of stability and atmospheric resistivity are demonstrated on various 2D materials, such as indium-tin-oxide (ITO) and 2D Si surfaces. The advantage of the reported approach on electronic and sensing devices is demonstrated by Si nanowire field effect transistors (SiNW FETs), which have shown a few orders of magnitude higher electrical and sensing performances, compared with devices obtained by conventional approaches. The compatibility of the reported approach with various materials and its simple implementation with a single reactor makes it easily scalable for various applications.