Bipolar Resistive Switching in Junctions of Gallium Oxide and p-type Silicon.

In this work, native GaOx is positioned between bulk gallium and degenerately doped p-type silicon (p+-Si) to form Ga/GaOx/SiOx/p+-Si junctions. These junctions show memristive behavior, exhibiting large current-voltage hysteresis. When cycled between -2.5 and 2.5 V, an abrupt insulator-metal transition is observed that is reversible when the polarity is reversed. The ON/OFF ratio between the high and low resistive states in these junctions can reach values on the order of 108 and retain the ON and OFF resistive states for up to 105 s with an endurance exceeding 100 cycles. The presence of a nanoscale layer of gallium oxide is critical to achieving reversible resistive switching by formation and dissolution of the gallium filament across the switching layer.

Vapor-Phase Nanopatterning of Aminosilanes with Electron Beam Lithography: Understanding and Minimizing Background Functionalization.

Electron beam lithography (EBL) is a highly precise, serial method for patterning surfaces. Positive tone EBL resists enable patterned exposure of the underlying surface, which can be subsequently functionalized for the application of interest. In the case of widely used native oxide-capped silicon surfaces, coupling an activated silane with electron beam lithography would enable nanoscale chemical patterning of the exposed regions. Aminoalkoxysilanes are extremely useful due to their reactive amino functionality but have seen little attention for nanopatterning silicon surfaces with an EBL resist due to background contamination. In this work, we investigated three commercial positive tone EBL resists, PMMA (950k and 495k) and ZEP520A (57k), as templates for vapor-phase patterning of two commonly used aminoalkoxysilanes, 3-aminopropyltrimethoxysilane (APTMS) and 3-aminopropyldiisopropylethoxysilane (APDIPES). The PMMA resists were susceptible to significant background reaction within unpatterned areas, a problem that was particularly acute with APTMS. On the other hand, with both APTMS and APDIPES exposure, unpatterned regions of silicon covered by the ZEP520A resist emerged pristine, as shown both with SEM images of the surfaces of the underlying silicon and through the lack of electrostatically driven binding of negatively charged gold nanoparticles. The ZEP520A resist allowed for the highly selective deposition of these alkoxyaminosilanes in the exposed areas, leaving the unpatterned areas clean, a claim also supported by contact angle measurements with four probe liquids and X-ray photoelectron spectroscopy (XPS). We investigated the mechanistic reasons for the stark contrast between the PMMA resists and ZEP520A, and it was found that the efficacy of resist removal appeared to be the critical factor in reducing the background functionalization. Differences in the molecular weight of the PMMA resists and the resulting influence on APTMS diffusion through the resist films are unlikely to have a significant impact. Area-selective nanopatterning of 15 nm gold nanoparticles using the ZEP520A resist was demonstrated, with no observable background conjugation noted in the unexposed areas on the silicon surface by SEM.

Methylammonium Cation Dynamics in Methylammonium Lead Halide Perovskites: A Solid-State NMR Perspective.

In light of the intense recent interest in the methylammonium lead halides, CH3NH3PbX3 (X = Cl, Br, and I) as sensitizers for photovoltaic cells, the dynamics of the methylammonium (MA) cation in these perovskite salts has been reinvestigated as a function of temperature via 2H, 14N, and 207Pb NMR spectroscopy. In the cubic phase of all three salts, the MA cation undergoes pseudoisotropic tumbling (picosecond time scale). For example, the correlation time, τ2, for the C-N axis of the iodide salt is 0.85 ± 0.30 ps at 330 K. The dynamics of the MA cation are essentially continuous across the cubic ↔ tetragonal phase transition; however, 2H and 14N NMR line shapes indicate that subtle ordering of the MA cation occurs in the tetragonal phase. The temperature dependence of the cation ordering is rationalized using a six-site model, with two equivalent sites along the c-axis and four equivalent sites either perpendicular or approximately perpendicular to this axis. As the cubic ↔ tetragonal phase transition temperature is approached, the six sites are nearly equally populated. Below the tetragonal ↔ orthorhombic phase transition, 2H NMR line shapes indicate that the C-N axis is essentially frozen.

Conjugation of A and B Blood Group Structures to Silica Microparticles for the Detection of Antigen-Specific B Cells.

Silica microparticles were functionalized with A and B blood group carbohydrate antigens (A type I, A type II, B type I, and B type II) to enable the detection and monitoring of ABO antigen-specific B cells. Microparticles were prepared via the Stöber synthesis, labeled with an Alexafluor fluorescent dye, and characterized via TEM and fluorescence microscopy. The silica microparticles were functionalized with (3-aminopropyl)trimethoxysilane (APTMS), followed by the use of an established fluorenylmethyloxycarbonyl (Fmoc)-protected PEG-based linker. The terminal Fmoc moiety of the PEG-based linker was then deprotected, yielding free amino groups, to which the A and B antigens were coupled. The carbohydrate antigens were synthesized with a p-nitrophenol ester to enable conjugation to the functionalized silica microparticles via an amide bond. The number of free amine groups available for coupling for a given mass of PEG-functionalized silica microparticles was quantified via reaction with Fmoc-glycine. The antigen-functionalized microparticles were then evaluated for their specificity in binding to A and B antigen-reactive B-cells via flow cytometry, and for blocking of naturally occurring antibodies in human serum. Selective binding of the functionalized microparticles to blood group-reactive B cells was observed by flow cytometry and fluorescence microscopy. The modular approach outlined here is applicable to the preparation of silica microparticles containing any carbohydrate antigen and alternative fluorophores or labels. This approach therefore comprises a novel, general platform for screening B cell populations for binding to carbohydrate antigens, including, in this case, the human A and B blood group antigens.

Sequential Nanopatterned Block Copolymer Self-Assembly on Surfaces.

Bottom-up self-assembly of high-density block-copolymer nanopatterns is of significant interest for a range of technologies, including memory storage and low-cost lithography for on-chip applications. The intrinsic or native spacing of a given block copolymer is dependent upon its size (N, degree of polymerization), composition, and the conditions of self-assembly. Polystyrene-block-polydimethylsiloxane (PS-b-PDMS) block copolymers, which are well-established for the production of strongly segregated single-layer hexagonal nanopatterns of silica dots, can be layered sequentially to produce density-doubled and -tripled nanopatterns. The center-to-center spacing and diameter of the resulting silica dots are critical with respect to the resulting double- and triple-layer assemblies because dot overlap reduces the quality of the resulting pattern. The addition of polystyrene (PS) homopolymer to PS-b-PDMS reduces the size of the resulting silica dots but leads to increased disorder at higher concentrations. The quality of these density-multiplied patterns can be calculated and predicted using parameters easily derived from SEM micrographs of corresponding single and multilayer patterns; simple geometric considerations underlie the degree of overlap of dots and layer-to-layer registration, two important factors for regular ordered patterns, and clearly defined dot borders. Because the higher-molecular-weight block copolymers tend to yield more regular patterns than smaller block copolymers, as defined by order and dot circularity, this sequential patterning approach may provide a route toward harnessing these materials, thus surpassing their native feature density.

From Molecules to Surfaces: Radical-Based Mechanisms of Si-S and Si-Se Bond Formation on Silicon.

The derivatization of silicon surfaces can have profound effects on the underlying electronic properties of the semiconductor. In this work, we investigate the radical surface chemistry of silicon with a range of organochalcogenide reagents (comprising S and Se) on a hydride-terminated silicon surface, to cleanly and efficiently produce surface Si-S and Si-Se bonds, at ambient temperature. Using a diazonium-based radical initiator, which induces formation of surface silicon radicals, a group of organochalcogenides were screened for reactivity at room temperature, including di-n-butyl disulfide, diphenyl disulfide, diphenyl diselenide, di-n-butyl sulfide, diphenyl selenide, diphenyl sulfide, 1-octadecanethiol, t-butyl disulfide, and t-butylthiol, which comprises the disulfide, diselenide, thiol, and thioether functionalities. The surface reactions were monitored by transmission mode Fourier transform infrared (FTIR) spectroscopy, X-ray photoelectron spectroscopy, and time-of-flight secondary ionization mass spectrometry. Calculation of Si-Hx consumption, a semiquantitative measure of yield of production of surface-bound Si-E bonds (E = S, Se), was carried out via FTIR spectroscopy. Control experiments, sans the BBD diazonium radical initiator, were all negative for any evident incorporation, as determined by FTIR spectroscopy. The functional groups that did react with surface silicon radicals included the dialkyl/diphenyl disulfides, diphenyl diselenide, and 1-octadecanethiol, but not t-butylthiol, diphenyl sulfide/selenide, and di-n-butyl sulfide. Through a comparison with the rich body of literature regarding molecular radicals, and in particular, silyl radicals, reaction mechanisms were proposed for each. Armed with an understanding of the reaction mechanisms, much of the known chemistry within the extensive body of radical-based reactivity has the potential to be harnessed on silicon and could be extended to a range of technologically relevant semiconductor surfaces, such as germanium, carbon, and others.

Density doubling of block copolymer templated features.

Block copolymers can be used to template large arrays of nanopatterns with periodicities equal to the characteristic spacing of the polymer. Here we demonstrate a technique capitalizing on the multilayered arrangement of cylindrical domains to effectively double the pattern density templated by a given polymer. By controlling the initial thickness of the film and the solvent annealing conditions, it was possible to reproducibly create density doubled lines by swelling the film with solvent until bilayers of horizontal cylinders were obtained. This process was also demonstrated to be compatible with graphoepitaxy.

Toward a mechanistic understanding of exciton-mediated hydrosilylation on nanocrystalline silicon.

White-light initiated hydrosilylation of nanocrystalline porous silicon was found to be far more efficient (in terms of both kinetics and yield) in the presence of electron-accepting molecules with suitably high reduction potentials, particularly halocarbons. It is known that absorption of visible light by nanocrystalline silicon results in the formation of excitons (electron/hole pairs) and that this exciton can be harnessed to drive a hydrosilylation reaction with an alkene; the Si-C bond forms as a result of attack of the π-electrons of the alkene on the positively charged holes. In order to better understand the white-light initiated mechanism through which this reaction takes place, and to compare with UV-mediated photoemission on Si(111)-H, a series of electron acceptors were screened for their effect on surface alkene hydrosilylation. A very strong correlation between reduction potentials (E(red)) of the oxidant and reaction efficiency was observed, with a minimum "turn-on" E(red) required for an increase to take place. The oxidant appears to accept, or remove, the electron from the nanocrystallite-bound exciton, favoring attack by the alkene on the positively charged Si nanocrystallite, leading to Si-C bond formation. Radical reactions were discounted for a number of reasons, including lack of effect of radical traps, no apparent Si-Cl bond formation, lack of oxidation of the surfaces, and others. Unlike with other oxidants such as nitro-aromatics, halocarbons do not cause additional surface reactions and promote very clean, fast, and selective hydrosilylation chemistry.

UV-initiated hydrosilylation on hydrogen-terminated silicon (111): rate coefficient increase of two orders of magnitude in the presence of aromatic electron acceptors.

UV-initiated (254 nm) hydrosilylation of hexadecene on Si(111)-H has been studied in the presence of various aliphatic and aromatic molecules (additives). Many of these additives cause an enhancement in the pseudo-first-order rate coefficient (k(obs)) of hydrosilylation, some up to 200× faster than observed in neat hexadecene. It is proposed that these additives capture the photoejected electron from the surface, thereby increasing the probability of reaction of the alkene with the surface hole (h(+)), leading to Si-C bond formation. While the ability of these additives to increase k(obs) is related to their reduction potential, aromatic additives are particularly efficient; we suspect this is due to the relatively strong physisorption of the aromatic molecules leading to a favorable geometry for electron transfer. The presence of these additives permits the use of a much lower intensity of UV light (~30 µW/cm(2)), reducing the probability of photodegradation of the monolayer, and maximum coverage can be reached within minutes.

Indium tin oxide nanopillar electrodes in polymer/fullerene solar cells.

Using high surface area nanostructured electrodes in organic photovoltaic (OPV) devices is a route to enhanced power conversion efficiency. In this paper, indium tin oxide (ITO) and hybrid ITO/SiO(2) nanopillars are employed as three-dimensional high surface area transparent electrodes in OPVs. The nanopillar arrays are fabricated via glancing angle deposition (GLAD) and electrochemically modified with nanofibrous PEDOT:PSS (poly(3,4-ethylenedioxythiophene):poly(p-styrenesulfonate)). The structures are found to have increased surface area as characterized by porosimetry. When applied as anodes in polymer/fullerene OPVs (architecture: commercial ITO/GLAD ITO/PEDOT:PSS/P3HT:PCBM/Al, where P3HT is 2,5-diyl-poly(3-hexylthiophene) and PCBM is [6,6]-phenyl-C(61)-butyric acid methyl ester), the air-processed solar cells incorporating high surface area, PEDOT:PSS-modified ITO nanoelectrode arrays operate with improved performance relative to devices processed identically on unstructured, commercial ITO substrates. The resulting power conversion efficiency is 2.2% which is a third greater than for devices prepared on commercial ITO. To further refine the structure, insulating SiO(2) caps are added above the GLAD ITO nanopillars to produce a hybrid ITO/SiO(2) nanoelectrode. OPV devices based on this system show reduced electrical shorting and series resistance, and as a consequence, a further improved power conversion efficiency of 2.5% is recorded.

Beyond Thin Films: Clarifying the Impact of c-Li15Si4 Formation in Thin Film, Nanoparticle, and Porous Si Electrodes.

The formation of the c-Li15Si4 phase has well-established detrimental effects on the capacity retention of thin film silicon electrodes. However, the role of this crystalline phase with respect to the loss of capacity is somewhat ambiguous in nanoscale morphologies. In this work, three silicon-based morphologies are examined, including planar films, porous planar films, and silicon nanoparticle composite powder electrodes. The cycling conditions are used as the lever to induce, or not induce, the formation of c-Li15Si4 through application of constant-current (CC) or constant-current constant-voltage (CCCV) steps. In this manner, the role of this phase on capacity retention and Coulombic efficiency can be determined with few other convoluting factors such as alteration of the composition or morphology of the silicon electrodes themselves. The results here confirm that the c-Li15Si4 phase increases the rate of capacity decay in planar films but has no major effect on capacity retention in half-cells based on porous silicon films or silicon nanoparticle composite powder electrodes, although this conclusion is nuanced. Besides using a constant-voltage step, formation of the c-Li15Si4 phase is influenced by the dimensions of the Si material and the lithiation cutoff voltage. Porous Si films, which, in this work, comprise primary Si particle sizes that are smaller than those in the preformed Si nanoparticle slurries, do not undergo the formation of c-Li15Si4 at 50 mV, whereas Si nanoparticle slurries are accompanied by the formation of c-Li15Si4 up to 80 mV. The solid-electrolyte interphase (SEI) formed from reaction of the c-Li15Si4 with the carbonate-based electrolyte causes polarization in both nanoparticle and porous film silicon electrodes and lowers the average Coulombic efficiency. A comparison of the cumulative irreversibilities due to SEI formation between different lithiation cutoff voltages in silicon nanoparticle slurry electrodes confirmed the connection between higher SEI buildup and formation of the c-Li15Si4 phase. This work indicates that concerns about the c-Li15Si4 phase in silicon nanoparticles and porous silicon electrodes should mainly focus on the stability of the SEI and a reduction of irreversible electrolyte reactions.

Solvent Vapor Annealing, Defect Analysis, and Optimization of Self-Assembly of Block Copolymers Using Machine Learning Approaches.

Self-assembly of block copolymers (BCPs) is an alternative patterning technique that promises high resolution and density multiplication with lower costs. The defectivity of the resulting nanopatterns remains too high for many applications in microelectronics and is exacerbated by small variations of processing parameters, such as film thickness, and fluctuations of solvent vapor pressure and temperature, among others. In this work, a solvent vapor annealing (SVA) flow-controlled system is combined with design of experiments (DOE) and machine learning (ML) approaches. The SVA flow-controlled system enables precise optimization of the conditions of self-assembly of the high Flory-Huggins interaction parameter (χ) hexagonal dot-array forming BCP, poly(styrene-b-dimethylsiloxane) (PS-b-PDMS). The defects within the resulting patterns at various length scales are then characterized and quantified. The results show that the defectivity of the resulting nanopatterned surfaces is highly dependent upon very small variations of the initial film thicknesses of the BCP, as well as the degree of swelling under the SVA conditions. These parameters also significantly contribute to the quality of the resulting pattern with respect to grain coarsening, as well as the formation of different macroscale phases (single and double layers and wetting layers). The results of qualitative and quantitative defect analyses are then compiled into a single figure of merit (FOM) and are mapped across the experimental parameter space using ML approaches, which enable the identification of the narrow region of optimum conditions for SVA for a given BCP. The result of these analyses is a faster and less resource intensive route toward the production of low-defectivity BCP dot arrays via rational determination of the ideal combination of processing factors. The DOE and machine learning-enabled approach is generalizable to the scale-up of self-assembly-based nanopatterning for applications in electronic microfabrication.

Molecular layer deposition of thiol-ene multilayers on semiconductor surfaces.

The fabrication of organic thin films with controlled chemical structure in the vertical direction (parallel to surface normal) is important for many practical and technological applications in organic electronics, chemical-resistant films, and biocompatible materials, among others. In order to achieve composition control in the z-direction, molecular layer deposition (MLD: covalent layer-by-layer assembly) of thin, organic films on silicon, silicon oxide, and germanium surfaces was carried out, using the well-established UV-induced thiol-ene reaction. Through successive contact of an interface with dithiol and diene molecules under UV irradiation for short periods (approximately 30 min, room temperature), well-defined thin films can be obtained. Linear increases in film thickness with respect to layer number were obtained for shorter aliphatic dienes and dithiols (C < or = 8), but with longer molecules and with aromatic substrates a self-limiting situation sets in whereby both ends of the molecule react with the surface, arresting film growth. The functionalized interfaces were characterized by ellipsometry, X-ray photoelectronic spectroscopy, and atomic force microscopy.

Surface area characterization of obliquely deposited metal oxide nanostructured thin films.

The glancing angle deposition (GLAD) technique is used to fabricate nanostructured thin films with high surface area. Quantifying this property is important for optimizing GLAD-based device performance. Our group has used high-sensitivity krypton gas adsorption and the complementary technique of cyclic voltammetry to measure surface area as a function of deposition angle, thickness, and morphological characteristics for several metal oxide thin films. In this work, we studied amorphous titanium dioxide (TiO(2)), amorphous silicon dioxide (SiO(2)), and polycrystalline indium tin oxide (ITO) nanostructures with vertical and helical post morphologies over a range of oblique deposition angles from 0 to 86 degrees. Krypton gas sorption isotherms, evaluated using the Brunauer-Emmettt-Teller (BET) method, revealed maximum surface area enhancements of 880 +/- 110, 980 +/- 125, and 210 +/- 30 times the footprint area (equivalently 300 +/- 40, 570 +/- 70, and 50 +/- 6 m(2) g(-1)) for vertical posts TiO(2), SiO(2), and ITO. We also applied the cyclic voltammetry technique to these ITO films and observed the same overall trends as seen with the BET method. In addition, we applied the BET method to the measurement of helical films and found that the surface area trend was shifted with respect to that of vertical post films. This revealed the important influence of the substrate rotation rate and film morphology on surface properties. Finally, we showed that the surface area scales linearly with film thickness, with slopes of 730 +/- 35 to 235 +/- 10 m(2) m(-2) microm(-1) found for titania vertical post films deposited at angles from 70 to 85 degrees. This characterization effort will allow for the optimization of solar, photonic, and sensing devices fabricated from thin metal oxide films using GLAD.

Screening of bimetallic heterogeneous nanoparticle catalysts for arene hydrogenation activity under ambient conditions.

This study focuses on the application of a simple screening approach to prepare and test heterogeneous mono- and bimetallic nanoparticle (NP) catalysts for arene hydrogenation activity under ambient conditions in a quick and time efficient manner, as well as detailed testing and characterization of identified active catalysts. Over 90 mono- and bimetallic NP catalysts supported on alumina were efficiently screened for arene hydrogenation activity under ambient conditions using toluene as a model substrate. Through this approach, four catalysts were determined to be active: RhPt/Al(2)O(3), RuPt/Al(2)O(3), IrPt/Al(2)O(3), and IrRh/Al(2)O(3). These catalysts were further synthesized and tested in bulk, and RhPt/Al(2)O(3) was confirmed to be the catalyst with the highest observed rate of all the bimetallic combinations screened. Further studies were then performed, and the metal loading, temperature, pressure, and substrate to metal ratios were varied to determine the effects of these variables on the activity of the RhPt/Al(2)O(3) catalyst and a CS(2) poisoning study was performed on this catalyst to determine the number of active sites. From the temperature studies, the activation energy was calculated to be 30.4 kJ/mol, which is moderate when compared to other arene hydrogenation catalysts (42.0 kJ/mol for the hydrogenation of toluene with Ru NPs, (1) and 34.7 and 45.6 kJ/mol for benzene hydrogenation with cuboctahedral and cubic Pt NPs, respectively, (2) have been reported). Transmission electron microscopy (TEM), X-ray photoelectron spectroscopy (XPS), and Brunauer-Emmett-Teller (BET) surface area measurements were used to characterize the active catalysts, where it was observed that very small zero oxidation state metal NPs were well dispersed throughout the high-surface area alumina support.

van der Waals Epitaxy of Soft Twisted Bilayers: Lattice Relaxation and Mass Density Waves.

Interfaces comprising incommensurate or twisted hexagonal lattices are ubiquitous and of great interest, from adsorbed organic/inorganic interfaces in electronic devices, to superlubricants, and more recently to van der Waals bilayer heterostructures (vdWHs) of graphene and other 2D materials that demonstrate a range of properties such as superconductivity and ferromagnetism. Here we show how growth of 2D crystalline domains of soft block copolymers (BCPs) on patterned hard hexagonal lattices provide fundamental insights into van der Waals heteroepitaxy. At moderate registration forces, it is experimentally found that these BCP-hard lattice vdWHs do not adopt a simple moiré superstructure, but instead adopt local structural relaxations known as mass density waves (MDWs). Simulations reveal that MDWs are a primary mechanism of energy minimization and are the origin of the observed preferential twist angle between the lattices.

Optimization of the Bulk Heterojunction of All-Small-Molecule Organic Photovoltaics Using Design of Experiment and Machine Learning Approaches.

All-small-molecule organic photovoltaic (OPV) cells based upon the small-molecule donor, DRCN5T, and nonfullerene acceptors, ITIC, IT-M, and IT-4F, were optimized using Design of Experiments (DOE) and machine learning (ML) approaches. This combination enables rational sampling of large parameter spaces in a sparse but mathematically deliberate fashion and promises economies of precious resources and time. This work focused upon the optimization of the core layer of the OPV device, the bulk heterojunction (BHJ). Many experimental processing parameters play critical roles in the overall efficiency of a given device and are often correlated and thus are difficult to parse individually. DOE was applied to the (i) solution concentration of the donor and acceptor ink used for spin-coating, (ii) the donor fraction, (iii) the temperature, and (iv) duration of the annealing of these films. The ML-based approach was then used to derive maps of the power conversion efficiencies (PCE) landscape for the first and second rounds of optimization to be used as guides to determine the optimal values of experimental processing parameters with respect to PCE. This work shows that with little knowledge of a potential combination of components for a given BHJ, a large parameter space can be effectively screened and investigated to rapidly determine its potential for high-efficiency OPVs.

Water-soluble pH-switchable cobalt complexes for aqueous symmetric redox flow batteries.

A water soluble octahedral Co(ii) complex, BCPIP-Co(ii), with 4 appended carboxylic groups on the ligand periphery is utilized as both posolyte and negolyte in an aqueous, symmetric redox flow battery (RFB). The full RFB demonstrates coulombic efficiencies >99% for up to 100 cycles.

Redox Flow Batteries: How to Determine Electrochemical Kinetic Parameters.

Redox flow batteries (RFBs) are promising energy storage candidates for grid deployment of intermittent renewable energy sources such as wind power and solar energy. Various new redox-active materials have been introduced to develop cost-effective and high-power-density next-generation RFBs. Electrochemical kinetics play critical roles in influencing RFB performance, notably the overpotential and cell power density. Thus, determining the kinetic parameters for the employed redox-active species is essential. In this Perspective, we provide the background, guidelines, and limitations for a proposed electrochemical protocol to define the kinetics of redox-active species in RFBs.

Catalytic stamp lithography for sub-100 nm patterning of organic monolayers.

A stamp-based nanoscale patterning technique of organic monolayers, termed catalytic stamp lithography, is described. The surface of poly(dimethylsiloxane) was patterned with catalytic Pd nanoparticles (NPs) via the use of self-assembled block copolymers. Using this catalytic stamp, catalytic hydrosilylations of terminal alkenes/alkynes were performed on H-terminated Si(111) or Si(100) surfaces to create nanoscale patterns of organic monolayers. Since the reaction takes place exclusively underneath the patterned Pd NPs (localized catalysis), the pattern formation is less susceptible to ink diffusion and stamp deformation, even at this sub-100 nm scale. A range of different molecular inks can be utilized to produce monolayer patterns of different chemical functionalities, and the stamps can be reused multiple times. The potential utility of this kind of chemically patterned surfaces as the basis for more complicated nanoarchitectures was demonstrated through gold nanoparticle capture, with a thiol-terminated nanopatterned silicon surface.