RESUMO
A thermal reflow technique is applied to high-index-contrast, sub-micron waveguides in As(2)S(3) chalcogenide glass to reduce the sidewall roughness and associated optical scattering loss. We show that the reflow process effectively decreases sidewall roughness of chalcogenide glass waveguides. A kinetic model is presented to quantitatively explain the sidewall roughness evolution during thermal reflow. Further, we develop a technique to calculate waveguide optical loss using the roughness evolution model, and predict the ultimate low loss limit in reflowed high-index-contrast glass waveguides. Up to 50% optical loss reduction after reflow treatment is experimentally observed, and the practical loss limiting factors are discussed.
Assuntos
Calcogênios/química , Vidro/química , Dispositivos Ópticos , Refratometria/instrumentação , Transferência de Energia , Desenho de Equipamento , Análise de Falha de Equipamento , Temperatura Alta , Teste de Materiais , Transição de FaseRESUMO
In this paper, attributes of chalcogenide glass (ChG) based integrated devices are discussed in detail, including origins of optical loss and processing steps used to reduce their contributions to optical component performance. Specifically, efforts to reduce loss and tailor optical characteristics of planar devices utilizing solution-based glass processing and thermal reflow techniques are presented and their results quantified. Post-fabrication trimming techniques based on the intrinsic photosensitivity of the chalcogenide glass are exploited to compensate for fabrication imperfections of ring resonators. Process parameters and implications on enhancement of device fabrication flexibility are presented.
Assuntos
Calcogênios/química , Tecnologia de Fibra Óptica/instrumentação , Vidro/química , Fotometria/instrumentação , Refratometria/instrumentação , Transdutores , Desenho de Equipamento , Análise de Falha de Equipamento , Raios Infravermelhos , Teste de Materiais , Integração de SistemasRESUMO
We report the first (to our knowledge) experimental observation of resonant cavity-enhanced photosensitivity in As(2)S(3) chalcogenide glass film at 1550 nm telecommunication wavelength. The measured photosensitivity threshold is <0.1 GW/cm(2), and a photoinduced refractive index increase as large as 0.016 is observed. The photosensitive process is athermal; further, we confirm the absence of two-photon absorption in As(2)S(3), suggesting that defect absorption accounts for the energy transfer from photons to glass network. Besides its potential application for reconfigurable photonics circuit, such photosensitivity is also an important design consideration for nonlinear optical devices using chalcogenide glasses.
RESUMO
Ternary chalcogenide glass films from identical parent bulk glasses were prepared by thermal evaporation (TE) and pulsed laser deposition (PLD) and subjected to 810-nm femtosecond laser exposure at both kHz and MHz repetition rates. The exposure-induced modification on the glass film's surface profile, refractive index, and structural properties were shown to be a function of laser irradiance, the number of laser pulses per focal spot, and repetition rate. Film response was shown to be related to deposition technique-related density and the number of glass bonds within the irradiated focal volume. The induced changes resulted from a reduction in glass network connectivity among GeS(4/2), GeS(4), S-S and S(3)Ge-S-GeS(3) units.
RESUMO
We have fabricated and tested, to the best of our knowledge, the first microfluidic device monolithically integrated with planar chalcogenide glass waveguides on a silicon substrate. High-quality Ge(23)Sb(7)S(70) glass films have been deposited onto oxide coated silicon wafers using thermal evaporation, and high-index-contrast channel waveguides have been defined using SF(6) plasma etching. Microfluidic channel patterning in photocurable resin (SU8) and channel sealing by a polydimethylsiloxane (PDMS) cover completed the device fabrication. The chalcogenide waveguides yield a transmission loss of 2.3 dB/cm at 1550 nm. We show in this letter that using this device, N-methylaniline can be detected using its well-defined absorption fingerprint of the N-H bond near 1496 nm. Our measurements indicate linear response of the sensor to varying N-methylaniline concentrations. From our experiments, a sensitivity of this sensor down to a N-methylaniline concentration 0.7 vol. % is expected. Given the low-cost fabrication process used, and robust device configuration, our integration scheme provides a promising device platform for chemical sensing applications.
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We demonstrate, for the first time to the best of our knowledge, low-loss, Si-CMOS-compatible fabrication of single-mode chalcogenide strip waveguides. As a novel route of chalcogenide glass film patterning, lift-off allows several benefits: leverage with Si-CMOS process compatibility; ability to fabricate single-mode waveguides with core sizes down to submicron range; and reduced sidewall roughness. High-index-contrast Ge(23)Sb(7)S(70) strip waveguides have been fabricated using lift-off with excellent uniformity of loss propagation and the lowest loss figure of reported to date. We also show that small core Ge(23)Sb(7)S(70) rib waveguides can be fabricated via lift-off as well, with loss figures lower than 0.5 dB/cm. Additionally, we find through waveguide modal analysis that although overall transmission loss is low, the predominant source of this loss comes from scattering at the sidewalls.
RESUMO
We experimentally demonstrate, for the first time, propagation loss reduction via graded-index (GRIN) cladding layers in high-index-contrast (HIC) glass waveguides. We show that scattering loss arising from sidewall roughness can be significantly reduced without compromising the high-index-contrast condition, by inserting thin GRIN cladding layers with refractive indices intermediate between the core and topmost cover of a strip waveguide. Loss as low as 1.5 dB/cm is achieved in small core (1.6 mum x 0.35 mum), high-index-contrast (Deltan = 1.37) arsenic-based sulfide strip waveguides. This GRIN cladding design is generally applicable to HIC waveguide systems such as Si/SiO2.
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The Raman gain spectra of millimeter thick As(2)S(3) and As(24)S(38)Se(38) glasses and Ge((23 - x))Ga(x)Sb(7)S((70 - y))Se(y) with x = 0 and 5 and y = 0, 2, 5 have been measured using a direct nonlinear optics technique. The pump light originated from a picosecond Nd:YAG laser operating at 1064 nm and a tunable optical parametric generator and amplifier (OPG/OPA) was used as a source for the probe light. A peak material Raman gain coefficient of (155 +/- 11) x 10(-13) m/W has been measured for the As(24)S(38)Se(38) glass. A reversible photodarkening effect which responds to picosecond pulses is also reported. Finally, surface optical damage threshold measurements were found to be less than 9 GW/cm(2) for the reported samples, values which are comparable to some TeO(2)-based glasses with lower nonlinearities.
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We have demonstrated what we believe to be the first chalcogenide glass racetrack microresonator using a complementary metal-oxide semiconductor-compatible lift-off technique with thermally evaporated As(2)S(3) films. The device simultaneously features a small footprint of 0.012 mm x 0.012 mm, a cavity Q (quality factor) of 10,000, and an extinction ratio of 32 dB. These resonators exhibit a very high sensitivity to refractive index changes with a demonstrated detection capability of Dn(As(2)S(3)=(4.5 x 10(-6)+/-10%) refractive index unit. The resonators were applied to derive a photorefractive response of As(2)S(3) to lambda=550 nm light. The resonator devices are a versatile platform for both sensing and glass material property investigation.
RESUMO
High-index-contrast compact microdisk resonators in thermally evaporated As2S3 and Ge17Sb12S71 chalcogenide glass films are designed and fabricated using standard UV lithography and characterized. Our pulley coupler configuration demonstrates coupling of the resonators to monolithically integrated photonic wire waveguides without resorting to demanding fine-line lithography. Microdisk resonators in As2S3 support whispering-gallery-mode with cavity quality factors (Q) exceeding 2 x 10(5), the highest Q value reported in resonator structures in chalcogenide glasses to the best of our knowledge. We have successfully demonstrated a lab-on-a-chip prototype sensor device with the integration of our resonator with planar microfluidic systems. The sensor shows a refractive index sensitivity of 182 nm/RIU (refractive index unit) and a wavelength resolution of 0.1 pm through a resonant peak fit. This corresponds to a refractive index detection limit of 8 x 10(-7) RIU at 1550 nm in wavelength, which could be further improved by shifting the operating wavelength to a region where water absorption is reduced.