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1.
Ophthalmic Surg Lasers ; 33(3): 221-7, 2002.
Artigo em Inglês | MEDLINE | ID: mdl-12027102

RESUMO

BACKGROUND AND OBJECTIVE: To demonstrate suitability of moiré interferometry to assess and quantify laser-induced shrinkage of scleral collagen for buckling procedures. MATERIALS AND METHODS: Scleral buckling of human cadaver eyes was investigated using a Coherent Ultrapulse CO2 laser. Projection moiré interferometry was employed to determine the out-of plane displacement produced by laser exposure, and in-situ optical microscopy of reference markers on the eye was used to measure in-plane shrinkage. RESULTS: Measurements based on moiré interferometry allow a three dimensional view of shape changes in the eye surface as laser treatment proceeds. Out-of-plane displacement reaches up to 1.5 mm with a single laser spot exposure. In-plane shrinkage reached a maximum of around 30%, which is similar to that reported by Sasoh et al (Ophthalmic Surg Lasers. 1998;29:410) for a Tm:YAG laser. CONCLUSION: The moiré technique is found to be suitable for quantifying the effects of CO2 laser scleral shrinkage and buckling. This can be further developed to provide a standardized method for experimental investigations of other laser sources for scleral shrinkage.


Assuntos
Interferometria/métodos , Terapia a Laser , Topografia de Moiré , Recurvamento da Esclera , Cadáver , Dióxido de Carbono , Desenho de Equipamento , Humanos , Imageamento Tridimensional , Interferometria/instrumentação , Terapia a Laser/instrumentação , Topografia de Moiré/instrumentação , Esclera/patologia , Recurvamento da Esclera/instrumentação
2.
ACS Nano ; 4(6): 3248-53, 2010 Jun 22.
Artigo em Inglês | MEDLINE | ID: mdl-20455584

RESUMO

We report a new single-step method to directly imprint nanometer-scale structures on photoreactive organic semiconductors. A surface relief grating is spontaneously formed when a light-emitting, liquid crystalline, and semiconducting thin film is irradiated by patterned light generated using a phase mask. Grating formation requires no postannealing nor wet etching so there is potential for high-throughput fabrication. The structured film is cross-linked for robustness. Gratings deeper than the original film thickness are made with periods as small as 265 nm. Grating formation is attributed to mass transfer, enhanced by self-assembly, from dark to illuminated regions. A photovoltaic device incorporating the grating is discussed.


Assuntos
Cristalização/métodos , Cristais Líquidos/química , Nanoestruturas/química , Nanoestruturas/ultraestrutura , Nanotecnologia/instrumentação , Fotografação/métodos , Semicondutores , Desenho de Equipamento , Análise de Falha de Equipamento , Substâncias Macromoleculares/química , Teste de Materiais , Conformação Molecular , Tamanho da Partícula , Propriedades de Superfície
3.
Chem Rev ; 103(2): 487-518, 2003 Feb.
Artigo em Inglês | MEDLINE | ID: mdl-12580640
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