RESUMO
Existing techniques for electron- and ion-beam lithography, routinely employed for nanoscale device fabrication and mask/mold prototyping, do not simultaneously achieve efficient (low fluence) exposure and high resolution. We report lithography using neon ions with fluence <1 ion/nm(2), â¼1000× more efficient than using 30 keV electrons, and resolution down to 7 nm half-pitch. This combination of resolution and exposure efficiency is expected to impact a wide array of fields that are dependent on beam-based lithography.
RESUMO
Meta-analytic studies have concluded that although training improves spatial cognition in both sexes, the male advantage generally persists. However, because some studies run counter to this pattern, a closer examination of the anomaly is warranted. The authors investigated the acquisition of a basic skill (spatial selective attention) using a matched-pair two-wave longitudinal design. Participants were screened with the use of an attentional visual field task, with the objective of selecting and matching 10 male-female pairs, over a wide range (30% to 57% correct). Subsequently, 20 participants 17-23 years of age (selected from 43 screened) were trained for 10 hr (distributed over several sessions) by playing a first-person shooter video game. This genre is known to be highly effective in enhancing spatial skills. All 20 participants improved, with matched members of the male-female pairs achieving very similar gains, independent of starting level. This is consistent with the hypothesis that the learning trajectory of women is not inferior to that of men when acquiring a basic spatial skill. Training methods that develop basic spatial skills may be essential to achieve gender parity in both basic and complex spatial tasks.