RESUMO
We have developed a method for designing the diffractive optics used in phase mask lithography. Genetic algorithms were used to inverse-design a grating's relief profile and associated exposure conditions so that desired periodic structures are formed. An experimentally promising grating designed to produce helices is demonstrated.
Assuntos
Desenho Assistido por Computador , Modelos Teóricos , Fotografação/métodos , Refratometria/instrumentação , Refratometria/métodos , Simulação por Computador , Desenho de Equipamento , Análise de Falha de EquipamentoRESUMO
We have developed a general technique using genetic algorithms to design photonic crystals to be fabricated by holographic lithography. In contrast to current analytical approaches that rely almost exclusively on symmetry considerations, this technique allows for high-fidelity approximations to real-space structures without limiting the search space to a prescribed set of symmetries. We have used this new technique to design a structure having a complete photonic band gap of 28%, the largest yet reported for holographic lithography.