1.
J Nanosci Nanotechnol
; 1(3): 287-90, 2001 Sep.
Artigo
em Inglês
| MEDLINE
| ID: mdl-12914064
RESUMO
The thermal stability of nanocrystalline diamond (NCD) films grown on mirror-polished silicon substrates by biased enhanced microwave plasma chemical vapor deposition was investigated. Different pieces of a NCD sample were annealed for 1 h in an ambient argon atmosphere at 200, 400, 600, and 800 degrees C. The structural and mechanical properties of as-grown and annealed samples were assessed. The surface roughness and high hardness of the samples remained fairly constant with annealing temperature.