RESUMO
In gated semiconductor devices, the space charge layer that is located under the gate electrode acts as the functional element. With increasing gate voltage, the microscopic process forming this space charge layer involves the subsequent ionization or electron capture of individual dopants within the semiconductor. In this Letter, a scanning tunneling microscope tip is used as a movable gate above the (110) surface of n-doped GaAs. We study the build-up process of the space charge region considering donors and visualize the charge states of individual and multi donor systems. The charge configuration of single donors is determined by the position of the tip and the applied gate voltage. In contrast, a two donor system with interdonor distances smaller than 10 nm shows a more complex behavior. The electrostatic interaction between the donors in combination with the modification of their electronic properties close to the surface results in ionization gaps and bistable charge switching behavior.
RESUMO
During growth of the dilute p-type ferromagnetic semiconductor Ga1-xMnxAs, interstitial manganese, Mni(2+), is formed when x exceeds 2%. The double donor Mni(2+) compensates the free holes that mediate ferromagnetism. Annealing causes out-diffusion of these interstitials, thereby increasing the Curie temperature. Here, we use cross sectional scanning tunneling microscopy and spectroscopy to visualize the potential landscape which arises due to the clustering of Mni(2+) in annealed p-i-n (GaMn)As-GaAs double barrier heterostructures. We map the local minima in the potential landscape, link them to clusters of individual Mni(2+) ions, and show that the ions are doubly charged.
RESUMO
We measured the ionization threshold voltage of individual impurities close to a semiconductor-vacuum interface, where we use the STM tip to ionize individual donors. We observe a reversed order of ionization with depth below the surface, which proves that the binding energy is enhanced towards the surface. This is in contrast to the predicted reduction for a Coulombic impurity in the effective mass approach. We can estimate the binding energy from the ionization threshold and show experimentally that in the case of silicon doped gallium arsenide the binding energy gradually increases over the last 1.2 nm below the (110) surface.
RESUMO
The charge state of individually addressable impurities in semiconductor material was manipulated with a scanning tunneling microscope. The manipulation was fully controlled by the position of the tip and the voltage applied between tip and sample. The experiments were performed at low temperature on the (110) surface of silicon doped GaAs. Silicon donors up to 1 nm below the surface can be reversibly switched between their neutral and ionized state by the local potential induced by the tip. By using ultrasharp tips, the switching process occurs close enough to the impurity to be observed as a sharp circular feature surrounding the donor. By utilizing the controlled manipulation, we were able to map the Coulomb potential of a single donor at the semiconductor-vacuum interface.