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Quantitative backscattered electron imaging of field emission scanning electron microscopy for discrimination of nano-scale elements with nm-order spatial resolution.
Kim, Hyonchol; Negishi, Tsutomu; Kudo, Masato; Takei, Hiroyuki; Yasuda, Kenji.
Afiliação
  • Kim H; Kanagawa Academy of Science and Technology, KSP East 310, 3-2-1 Sakado, Takatsu-ku, Kawasaki, Kanagawa 213-0012, Japan.
J Electron Microsc (Tokyo) ; 59(5): 379-85, 2010.
Article em En | MEDLINE | ID: mdl-20375323
ABSTRACT
Discrimination of thin film elements by backscattered electron (BSE) imaging of field emission scanning electron microscope was examined. Incident electron acceleration voltage dependence on thin films' BSE intensities in five elements (Au, Ag, Ge, Cu and Fe) on a silicon substrate was experimentally measured from 3 to 30 kV. Normalization of BSE intensities using the difference between maximum and minimum brightness was proposed and allowed reproducible comparison among the elements. Measured intensities, which have correlation with electron backscattering coefficient against atomic number, indicated the existence of adequate acceleration voltage for improvement of resolution to discriminate different elements, showing the possibility of discriminating at least these six elements simultaneously by BSE imaging with nanometer-scale spatial resolution.

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Tipo de estudo: Prognostic_studies Idioma: En Revista: J Electron Microsc (Tokyo) Ano de publicação: 2010 Tipo de documento: Article País de afiliação: Japão

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Tipo de estudo: Prognostic_studies Idioma: En Revista: J Electron Microsc (Tokyo) Ano de publicação: 2010 Tipo de documento: Article País de afiliação: Japão