Highly transparent and conductive ZnO: Al thin films from a low temperature aqueous solution approach.

Hagendorfer, Harald; Lienau, Karla; Nishiwaki, Shiro; Fella, Carolin M; Kranz, Lukas; Uhl, Alexander R; Jaeger, Dominik; Luo, Li; Gretener, Christina; Buecheler, Stephan; Romanyuk, Yaroslav E; Tiwari, Ayodhya N

Hagendorfer, Harald; Lienau, Karla; Nishiwaki, Shiro; Fella, Carolin M; Kranz, Lukas; Uhl, Alexander R; Jaeger, Dominik; Luo, Li; Gretener, Christina; Buecheler, Stephan; Romanyuk, Yaroslav E; Tiwari, Ayodhya N.

Afiliação

Hagendorfer H; Empa - Swiss Federal Laboratories for Materials Science and Technology, Laboratory for Thin Films and Photovoltaics, Ueberlandstrasse 129, CH-8600, Duebendorf.

Adv Mater ; 26(4): 632-6, 2014 Jan.

Article em En | MEDLINE | ID: mdl-24151235

Palavras-chave

UV annealing; aqueous solution deposition; doped zinc oxides; low temperature processing; transparent conductive oxides

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Adv Mater Assunto da revista: BIOFISICA / QUIMICA Ano de publicação: 2014 Tipo de documento: Article

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