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Interface Control of Ferroelectricity in an SrRuO3 /BaTiO3 /SrRuO3 Capacitor and its Critical Thickness.
Shin, Yeong Jae; Kim, Yoonkoo; Kang, Sung-Jin; Nahm, Ho-Hyun; Murugavel, Pattukkannu; Kim, Jeong Rae; Cho, Myung Rae; Wang, Lingfei; Yang, Sang Mo; Yoon, Jong-Gul; Chung, Jin-Seok; Kim, Miyoung; Zhou, Hua; Chang, Seo Hyoung; Noh, Tae Won.
Afiliação
  • Shin YJ; Center for Correlated Electron Systems, Institute for Basic Science (IBS), Seoul, 08826, Republic of Korea.
  • Kim Y; Department of Physics and Astronomy, Seoul National University, Seoul, 08826, Republic of Korea.
  • Kang SJ; Department of Materials Science and Engineering and Research Institute of Advanced Materials, Seoul National University, Seoul, 08826, Republic of Korea.
  • Nahm HH; Center for Correlated Electron Systems, Institute for Basic Science (IBS), Seoul, 08826, Republic of Korea.
  • Murugavel P; Department of Physics and Astronomy, Seoul National University, Seoul, 08826, Republic of Korea.
  • Kim JR; Center for Correlated Electron Systems, Institute for Basic Science (IBS), Seoul, 08826, Republic of Korea.
  • Cho MR; Department of Physics and Astronomy, Seoul National University, Seoul, 08826, Republic of Korea.
  • Wang L; Department of Physics, Indian Institute of Technology Madras, Chennai, 600036, India.
  • Yang SM; Center for Correlated Electron Systems, Institute for Basic Science (IBS), Seoul, 08826, Republic of Korea.
  • Yoon JG; Department of Physics and Astronomy, Seoul National University, Seoul, 08826, Republic of Korea.
  • Chung JS; Center for Correlated Electron Systems, Institute for Basic Science (IBS), Seoul, 08826, Republic of Korea.
  • Kim M; Department of Physics and Astronomy, Seoul National University, Seoul, 08826, Republic of Korea.
  • Zhou H; Center for Correlated Electron Systems, Institute for Basic Science (IBS), Seoul, 08826, Republic of Korea.
  • Chang SH; Department of Physics and Astronomy, Seoul National University, Seoul, 08826, Republic of Korea.
  • Noh TW; Department of Physics, Sookmyung Women's University, Seoul, 04310, Republic of Korea.
Adv Mater ; 29(19)2017 May.
Article em En | MEDLINE | ID: mdl-28256752
ABSTRACT
The atomic-scale synthesis of artificial oxide heterostructures offers new opportunities to create novel states that do not occur in nature. The main challenge related to synthesizing these structures is obtaining atomically sharp interfaces with designed termination sequences. In this study, it is demonstrated that the oxygen pressure (PO2) during growth plays an important role in controlling the interfacial terminations of SrRuO3 /BaTiO3 /SrRuO3 (SRO/BTO/SRO) ferroelectric (FE) capacitors. The SRO/BTO/SRO heterostructures are grown by a pulsed laser deposition method. The top SRO/BTO interface, grown at high PO2 (around 150 mTorr), usually exhibits a mixture of RuO2 -BaO and SrO-TiO2 terminations. By reducing PO2, the authors obtain atomically sharp SRO/BTO top interfaces with uniform SrO-TiO2 termination. Using capacitor devices with symmetric and uniform interfacial termination, it is demonstrated for the first time that the FE critical thickness can reach the theoretical limit of 3.5 unit cells.
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Adv Mater Assunto da revista: BIOFISICA / QUIMICA Ano de publicação: 2017 Tipo de documento: Article

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Adv Mater Assunto da revista: BIOFISICA / QUIMICA Ano de publicação: 2017 Tipo de documento: Article