Photolithography-Based Nanopatterning Using Re-entrant Photoresist Profile.

Kim, Tong June; Jung, Yei Hwan; Zhang, Huilong; Kim, Kwangeun; Lee, Juhwan; Ma, Zhenqiang

Kim, Tong June; Jung, Yei Hwan; Zhang, Huilong; Kim, Kwangeun; Lee, Juhwan; Ma, Zhenqiang.

Afiliação

Kim TJ; Department of Electrical and Computer Engineering , University of Wisconsin-Madison , Madison , Wisconsin 53706 , United States.
Jung YH; Department of Electrical and Computer Engineering , University of Wisconsin-Madison , Madison , Wisconsin 53706 , United States.
Zhang H; Department of Electrical and Computer Engineering , University of Wisconsin-Madison , Madison , Wisconsin 53706 , United States.
Kim K; Department of Electrical and Computer Engineering , University of Wisconsin-Madison , Madison , Wisconsin 53706 , United States.
Lee J; Department of Electrical and Computer Engineering , University of Wisconsin-Madison , Madison , Wisconsin 53706 , United States.
Ma Z; Department of Electrical and Computer Engineering , University of Wisconsin-Madison , Madison , Wisconsin 53706 , United States.

ACS Appl Mater Interfaces ; 10(9): 8117-8123, 2018 Mar 07.

Article em En | MEDLINE | ID: mdl-29345131

Palavras-chave

high-speed transistor; nanofabrication; nanopatterning; re-entrant profile; subwavelength photolithography

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Tipo de estudo: Clinical_trials Idioma: En Revista: ACS Appl Mater Interfaces Assunto da revista: BIOTECNOLOGIA / ENGENHARIA BIOMEDICA Ano de publicação: 2018 Tipo de documento: Article País de afiliação: Estados Unidos

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