Molecular Layer Deposition Using Ring-Opening Reactions: Molecular Modeling of the Film Growth and the Effects of Hydrogen Peroxide.

Keskiväli, Laura; Putkonen, Matti; Puhakka, Eini; Kenttä, Eija; Kint, Jeroen; Ramachandran, Ranjith K; Detavernier, Christophe; Simell, Pekka

Keskiväli, Laura; Putkonen, Matti; Puhakka, Eini; Kenttä, Eija; Kint, Jeroen; Ramachandran, Ranjith K; Detavernier, Christophe; Simell, Pekka.

Afiliação

Keskiväli L; VTT Technical Research Centre of Finland, P.O. Box 1000, 02044 Espoo, Finland.
Putkonen M; VTT Technical Research Centre of Finland, P.O. Box 1000, 02044 Espoo, Finland.
Puhakka E; Department of Chemistry, University of Helsinki, P.O. Box 55, FI-00014 Helsinki, Finland.
Kenttä E; VTT Technical Research Centre of Finland, P.O. Box 1000, 02044 Espoo, Finland.
Kint J; Department of Solid State Sciences, Ghent University, Krijgslaan 281/S1, B-9000 Gent, Belgium.
Ramachandran RK; Department of Solid State Sciences, Ghent University, Krijgslaan 281/S1, B-9000 Gent, Belgium.
Detavernier C; Department of Solid State Sciences, Ghent University, Krijgslaan 281/S1, B-9000 Gent, Belgium.
Simell P; VTT Technical Research Centre of Finland, P.O. Box 1000, 02044 Espoo, Finland.

ACS Omega ; 3(7): 7141-7149, 2018 Jul 31.

Article em En | MEDLINE | ID: mdl-31458876

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: ACS Omega Ano de publicação: 2018 Tipo de documento: Article País de afiliação: Finlândia

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