Route to Cost-Effective Fabrication of Wafer-Scale Nanostructure through Self-Priming Nanoimprint.

Su, Yue; Geng, Zhaoxin; Fang, Weihao; Lv, Xiaoqing; Wang, Shicai; Ma, Zhengtai; Pei, Weihua

Su, Yue; Geng, Zhaoxin; Fang, Weihao; Lv, Xiaoqing; Wang, Shicai; Ma, Zhengtai; Pei, Weihua.

Afiliação

Su Y; State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China.
Geng Z; College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China.
Fang W; School of Information Engineering, Minzu University of China, Beijing 100081, China.
Lv X; State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China.
Wang S; College of Materials Science and Opto-Electronic Technology, University of Chinese Academy of Sciences, Beijing 100049, China.
Ma Z; State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China.
Pei W; State Key Laboratory of Crystal Materials, Shandong University, Jinan 250100, China.

Micromachines (Basel) ; 12(2)2021 Jan 24.

Article em En | MEDLINE | ID: mdl-33498873

Palavras-chave

double-layer; nanoimprint; nanostructure; wafer-scale

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Tipo de estudo: Health_economic_evaluation Idioma: En Revista: Micromachines (Basel) Ano de publicação: 2021 Tipo de documento: Article País de afiliação: China

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