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Group IV Transition Metal (M = Zr, Hf) Precursors for High-κ Metal Oxide Thin Films.
Lee, Ga Yeon; Yeo, Seungmin; Han, Seong Ho; Park, Bo Keun; Eom, Taeyong; Kim, Jeong Hwan; Kim, Soo-Hyun; Kim, Hyungjun; Son, Seung Uk; Chung, Taek-Mo.
Afiliação
  • Lee GY; Thin Film Materials Research Center, Korea Research Institute of Chemical Technology, Daejeon 34114, Republic of Korea.
  • Yeo S; Department of Chemistry, Sungkyunkwan University, Suwon 16419, Republic of Korea.
  • Han SH; Thin Film Materials Research Center, Korea Research Institute of Chemical Technology, Daejeon 34114, Republic of Korea.
  • Park BK; School of Electrical and Electronic Engineering, Yonsei University, Seodaemun-gu, Seoul 03722, Republic of Korea.
  • Eom T; Thin Film Materials Research Center, Korea Research Institute of Chemical Technology, Daejeon 34114, Republic of Korea.
  • Kim JH; Thin Film Materials Research Center, Korea Research Institute of Chemical Technology, Daejeon 34114, Republic of Korea.
  • Kim SH; Department of Chemical Convergence Materials, University of Science and Technology (UST), Deajeon 34113, Republic of Korea.
  • Kim H; Thin Film Materials Research Center, Korea Research Institute of Chemical Technology, Daejeon 34114, Republic of Korea.
  • Son SU; Department of Advanced Materials Engineering, Hanbat National University, Daejeon 34158, Republic of Korea.
  • Chung TM; School of Materials Science and Engineering, Yeungnam University, Gyeongsan, Gyeongbuk 38541, Republic of Korea.
Inorg Chem ; 60(23): 17722-17732, 2021 Dec 06.
Article em En | MEDLINE | ID: mdl-34813316
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Inorg Chem Ano de publicação: 2021 Tipo de documento: Article
Texto completo
Imprimir
XML
PubMed Links
Buscar no Google

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Inorg Chem Ano de publicação: 2021 Tipo de documento: Article