Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO<sub>2</sub> Thin Films Grown by DC Reactive Magnetron Sputtering.

Xi, Yingxue; Qin, Xinghui; Li, Wantong; Luo, Xi; Zhang, Jin; Liu, Weiguo; Yang, Pengfei

Effect of Substrate Negative Bias on the Microstructural, Optical, Mechanical, and Laser Damage Resistance Properties of HfO₂ Thin Films Grown by DC Reactive Magnetron Sputtering.

Xi, Yingxue; Qin, Xinghui; Li, Wantong; Luo, Xi; Zhang, Jin; Liu, Weiguo; Yang, Pengfei.

Afiliação

Xi Y; School of Optoelectronic Engineering, Xi'an Technological University, Xi'an 710021, China.
Qin X; School of Optoelectronic Engineering, Xi'an Technological University, Xi'an 710021, China.
Li W; School of Optoelectronic Engineering, Xi'an Technological University, Xi'an 710021, China.
Luo X; School of Optoelectronic Engineering, Xi'an Technological University, Xi'an 710021, China.
Zhang J; School of Optoelectronic Engineering, Xi'an Technological University, Xi'an 710021, China.
Liu W; School of Optoelectronic Engineering, Xi'an Technological University, Xi'an 710021, China.
Yang P; School of Optoelectronic Engineering, Xi'an Technological University, Xi'an 710021, China.

Micromachines (Basel) ; 14(9)2023 Sep 21.

Article em En | MEDLINE | ID: mdl-37763963

Palavras-chave

HfO2; laser-induced damage threshold; negative bias; optical properties; reactive magnetron sputtering

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Micromachines (Basel) Ano de publicação: 2023 Tipo de documento: Article País de afiliação: China

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