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Atomically Thin Amorphous Indium-Oxide Semiconductor Film Developed Using a Solution Process for High-Performance Oxide Transistors.
Park, Jun-Hyeong; Park, Won; Na, Jeong-Hyeon; Lee, Jinuk; Eun, Jun-Su; Feng, Junhao; Kim, Do-Kyung; Bae, Jin-Hyuk.
Afiliação
  • Park JH; School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 41566, Republic of Korea.
  • Park W; School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 41566, Republic of Korea.
  • Na JH; School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 41566, Republic of Korea.
  • Lee J; School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 41566, Republic of Korea.
  • Eun JS; School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 41566, Republic of Korea.
  • Feng J; School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 41566, Republic of Korea.
  • Kim DK; School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 41566, Republic of Korea.
  • Bae JH; School of Electronic and Electrical Engineering, Kyungpook National University, Daegu 41566, Republic of Korea.
Nanomaterials (Basel) ; 13(18)2023 Sep 16.
Article em En | MEDLINE | ID: mdl-37764597
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nanomaterials (Basel) Ano de publicação: 2023 Tipo de documento: Article
Texto completo
Imprimir
XML
PubMed Links
Buscar no Google

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nanomaterials (Basel) Ano de publicação: 2023 Tipo de documento: Article