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High-κ Wide-Gap Layered Dielectric for Two-Dimensional van der Waals Heterostructures.
Söll, Aljoscha; Lopriore, Edoardo; Ottesen, Asmund; Luxa, Jan; Pasquale, Gabriele; Sturala, Jiri; Hájek, Frantisek; Jarý, Vítezslav; Sedmidubský, David; Mosina, Kseniia; Sokolovic, Igor; Rasouli, Saeed; Grasser, Tibor; Diebold, Ulrike; Kis, Andras; Sofer, Zdenek.
Afiliação
  • Söll A; Department of Inorganic Chemistry, University of Chemistry and Technology Prague, Technicka 5, 166 28, Prague 6, Czech Republic.
  • Lopriore E; Institute of Electrical and Microengineering, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
  • Ottesen A; Institute of Materials Science and Engineering, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
  • Luxa J; Institute of Electrical and Microengineering, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
  • Pasquale G; Institute of Materials Science and Engineering, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
  • Sturala J; Department of Inorganic Chemistry, University of Chemistry and Technology Prague, Technicka 5, 166 28, Prague 6, Czech Republic.
  • Hájek F; Institute of Electrical and Microengineering, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
  • Jarý V; Institute of Materials Science and Engineering, École Polytechnique Fédérale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland.
  • Sedmidubský D; Department of Inorganic Chemistry, University of Chemistry and Technology Prague, Technicka 5, 166 28, Prague 6, Czech Republic.
  • Mosina K; Institute of Physics of the Czech Academy of Sciences, v.v.i., Cukrovarnická 10, 162 00, Prague 6, Czech Republic.
  • Sokolovic I; Institute of Physics of the Czech Academy of Sciences, v.v.i., Cukrovarnická 10, 162 00, Prague 6, Czech Republic.
  • Rasouli S; Department of Inorganic Chemistry, University of Chemistry and Technology Prague, Technicka 5, 166 28, Prague 6, Czech Republic.
  • Grasser T; Department of Inorganic Chemistry, University of Chemistry and Technology Prague, Technicka 5, 166 28, Prague 6, Czech Republic.
  • Diebold U; Institute of Microelectronics, TU Wien, Gußhausstraße 27-29, 1040 Vienna, Austria.
  • Kis A; Institute of Applied Physics, TU Wien, Wiedner Hauptstraße 8-10, 1040 Vienna, Austria.
  • Sofer Z; Institute of Applied Physics, TU Wien, Wiedner Hauptstraße 8-10, 1040 Vienna, Austria.
ACS Nano ; 18(15): 10397-10406, 2024 Apr 16.
Article em En | MEDLINE | ID: mdl-38557003
ABSTRACT
van der Waals heterostructures of two-dimensional materials have unveiled frontiers in condensed matter physics, unlocking unexplored possibilities in electronic and photonic device applications. However, the investigation of wide-gap, high-κ layered dielectrics for devices based on van der Waals structures has been relatively limited. In this work, we demonstrate an easily reproducible synthesis method for the rare-earth oxyhalide LaOBr, and we exfoliate it as a 2D layered material with a measured static dielectric constant of 9 and a wide bandgap of 5.3 eV. Furthermore, our research demonstrates that LaOBr can be used as a high-κ dielectric in van der Waals field-effect transistors with high performance and low interface defect concentrations. Additionally, it proves to be an attractive choice for electrical gating in excitonic devices based on 2D materials. Our work demonstrates the versatile realization and functionality of 2D systems with wide-gap and high-κ van der Waals dielectric environments.
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: ACS Nano Ano de publicação: 2024 Tipo de documento: Article País de afiliação: República Tcheca

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: ACS Nano Ano de publicação: 2024 Tipo de documento: Article País de afiliação: República Tcheca