Fabrication of Aluminum Oxide Thin-Film Devices Based on Atomic Layer Deposition and Pulsed Discrete Feed Method.

This study demonstrates the low-temperature (<100 °C) process for growing a thin silica buffer layer and aluminum oxide by atomic layer deposition (ALD) in the same reaction chamber. Heterogeneous multilayer thin films are prepared by a dual-mode equipment based on atomic layer deposition and plasma-enhanced chemical vapor deposition (PECVD) techniques. The pulse discrete feeding method (DFM) was used to divide the precursor purging steps into smaller intervals and generate discrete feeds, which improved the saturated distribution of gas precursors, film density and deposition selectivity. The experimental results show that the process method produces a uniform microstructure and that the best film uniformity is ±2.3% and growth rate is 0.69 Å/cycle. The thickness of aluminum oxide film has a linear relationship with the cyclic growth number from 360 to 1800 cycles. Meanwhile, the structural and mechanical stress properties of aluminum oxide thin films were also verified to meet the requirements of advanced thin-film devices.

Approaches for Long Lifetime Organic Light Emitting Diodes.

Organic light emitting diodes (OLEDs) have been well known for their potential usage in the lighting and display industry. The device efficiency and lifetime have improved considerably in the last three decades. However, for commercial applications, operational lifetime still lies as one of the looming challenges. In this review paper, an in-depth description of the various factors which affect OLED lifetime, and the related solutions is attempted to be consolidated. Notably, all the known intrinsic and extrinsic degradation phenomena and failure mechanisms, which include the presence of dark spot, high heat during device operation, substrate fracture, downgrading luminance, moisture attack, oxidation, corrosion, electron induced migrations, photochemical degradation, electrochemical degradation, electric breakdown, thermomechanical failures, thermal breakdown/degradation, and presence of impurities within the materials and evaporator chamber are reviewed. Light is also shed on the materials and device structures which are developed in order to obtain along with developed materials and device structures to obtain stable devices. It is believed that the theme of this report, summarizing the knowledge of mechanisms allied with OLED degradation, would be contributory in developing better-quality OLED materials and, accordingly, longer lifespan devices.