Integrated visible-light liquid-crystal-based phase modulators.

In this work, an integrated liquid-crystal-based phase modulator operating at visible wavelengths was developed and experimentally demonstrated. A visible-light silicon-nitride-based 300-mm-wafer foundry platform and a liquid-crystal integration process were developed to leverage the birefringence of liquid crystal to actively tune the effective index of a section of silicon-nitride waveguide and induce a phase shift over its length. The device was experimentally shown to achieve a 41π phase shift within 4.8 Vpp for a 500-µm-long modulator, which means that a 2π phase shifter would need to be only 24.4 µm long. This device is a compact and low-power solution to the challenge of integrated phase modulation in silicon nitride and paves the way for future low-power small-form-factor integrated systems at visible wavelengths.

Supercontinuum generation in varying dispersion and birefringent silicon waveguide.

Ability to selectively enhance the amplitude and maintain high coherence of the supercontinuum signal with long pulses is gaining significance. In this work, an extra degree of freedom afforded by varying the dispersion profile of a waveguide is utilized to selectively enhance supercontinuum. As much as 16 dB signal enhancement in the telecom window and 100 nm of wavelength extension is achieved with a cascaded waveguide, compared to a fixed dispersion waveguide. Waveguide tapering, in particular with increasing width, is determined to have a flatter and more coherent supercontinuum than a fixed dispersion waveguide when longer input pulses are used. Furthermore, due to the strong birefringence of an asymmetric silicon waveguide the supercontinuum signal is broadened by pumping simultaneously with both quasi-transverse electric (TE) and quasi-transverse magnetic (TM) mode in the anomalous dispersion regime. Thus, selective signal generation is obtained by controlling the dispersion for the two modes. Such waveguides offer several advantages over optical fiber as the variation in dispersion can be controlled with greater flexibility in an integrated platform. This work paves the way forward for various applications in fields ranging from medicine to telecom where specific wavelength windows need to be targeted.

Integrated CMOS-compatible Q-switched mode-locked lasers at 1900nm with an on-chip artificial saturable absorber.

We present a CMOS-compatible, Q-switched mode-locked integrated laser operating at 1.9 µm with a compact footprint of 23.6 × 0.6 × 0.78mm. The Q-switching rate is 720 kHz, the mode-locking rate is 1.2 GHz, and the optical bandwidth is 17nm, which is sufficient to support pulses as short as 215 fs. The laser is fabricated using a silicon nitride on silicon dioxide 300-mm wafer platform, with thulium-doped Al2O3 glass as a gain material deposited over the silicon photonics chip. An integrated Kerr-nonlinearity-based artificial saturable absorber is implemented in silicon nitride. A broadband (over 100 nm) dispersion-compensating grating in silicon nitride provides sufficient anomalous dispersion to compensate for the normal dispersion of the other laser components, enabling femtosecond-level pulses. The laser has no off-chip components with the exception of the optical pump, allowing for easy co-integration of numerous other photonic devices such as supercontinuum generation and frequency doublers which together potentially enable fully on-chip frequency comb generation.

Large-scale nanophotonic phased array.

Electromagnetic phased arrays at radio frequencies are well known and have enabled applications ranging from communications to radar, broadcasting and astronomy. The ability to generate arbitrary radiation patterns with large-scale phased arrays has long been pursued. Although it is extremely expensive and cumbersome to deploy large-scale radiofrequency phased arrays, optical phased arrays have a unique advantage in that the much shorter optical wavelength holds promise for large-scale integration. However, the short optical wavelength also imposes stringent requirements on fabrication. As a consequence, although optical phased arrays have been studied with various platforms and recently with chip-scale nanophotonics, all of the demonstrations so far are restricted to one-dimensional or small-scale two-dimensional arrays. Here we report the demonstration of a large-scale two-dimensional nanophotonic phased array (NPA), in which 64 × 64 (4,096) optical nanoantennas are densely integrated on a silicon chip within a footprint of 576 µm × 576 µm with all of the nanoantennas precisely balanced in power and aligned in phase to generate a designed, sophisticated radiation pattern in the far field. We also show that active phase tunability can be realized in the proposed NPA by demonstrating dynamic beam steering and shaping with an 8 × 8 array. This work demonstrates that a robust design, together with state-of-the-art complementary metal-oxide-semiconductor technology, allows large-scale NPAs to be implemented on compact and inexpensive nanophotonic chips. In turn, this enables arbitrary radiation pattern generation using NPAs and therefore extends the functionalities of phased arrays beyond conventional beam focusing and steering, opening up possibilities for large-scale deployment in applications such as communication, laser detection and ranging, three-dimensional holography and biomedical sciences, to name just a few.

High-Q-factor Al2O3 micro-trench cavities integrated with silicon nitride waveguides on silicon.

We report on the design and performance of high-Q integrated optical micro-trench cavities on silicon. The microcavities are co-integrated with silicon nitride bus waveguides and fabricated using wafer-scale silicon-photonics-compatible processing steps. The amorphous aluminum oxide resonator material is deposited via sputtering in a single straightforward post-processing step. We examine the theoretical and experimental optical properties of the aluminum oxide micro-trench cavities for different bend radii, film thicknesses and near-infrared wavelengths and demonstrate experimental Q factors of > 106. We propose that this high-Q micro-trench cavity design can be applied to incorporate a wide variety of novel microcavity materials, including rare-earth-doped films for microlasers, into wafer-scale silicon photonics platforms.

Broadband 2-µm emission on silicon chips: monolithically integrated Holmium lasers.

Laser sources in the mid-infrared are of great interest due to their wide applications in detection, sensing, communication and medicine. Silicon photonics is a promising technology which enables these laser devices to be fabricated in a standard CMOS foundry, with the advantages of reliability, compactness, low cost and large-scale production. In this paper, we demonstrate a holmium-doped distributed feedback laser monolithically integrated on a silicon photonics platform. The Al2O3:Ho3+ glass is used as gain medium, which provides broadband emission around 2 µm. By varying the distributed feedback grating period and Al2O3:Ho3+ gain layer thickness, we show single mode laser emission at wavelengths ranging from 2.02 to 2.10 µm. Using a 1950 nm pump, we measure a maximum output power of 15 mW, a slope efficiency of 2.3% and a side-mode suppression ratio in excess of 50 dB. The introduction of a scalable monolithic light source emitting at > 2 µm is a significant step for silicon photonic microsystems operating in this highly promising wavelength region.

Monolithically integrated erbium-doped tunable laser on a CMOS-compatible silicon photonics platform.

A tunable laser source is a crucial photonic component for many applications, such as spectroscopic measurements, wavelength division multiplexing (WDM), frequency-modulated light detection and ranging (LIDAR), and optical coherence tomography (OCT). In this article, we demonstrate the first monolithically integrated erbium-doped tunable laser on a complementary-metal-oxide-semiconductor (CMOS)-compatible silicon photonics platform. Erbium-doped Al2O3 sputtered on top is used as a gain medium to achieve lasing. The laser achieves a tunability from 1527 nm to 1573 nm, with a >40 dB side mode suppression ratio (SMSR). The wide tuning range (46 nm) is realized with a Vernier cavity, formed by two Si3N4 microring resonators. With 107 mW on-chip 980 nm pump power, up to 1.6 mW output lasing power is obtained with a 2.2% slope efficiency. The maximum output power is limited by pump power. Fine tuning of the laser wavelength is demonstrated by using the gain cavity phase shifter. Signal response times are measured to be around 200 µs and 35 µs for the heaters used to tune the Vernier rings and gain cavity longitudinal mode, respectively. The linewidth of the laser is 340 kHz, measured via a self-delay heterodyne detection method. Furthermore, the laser signal is stabilized by continuous locking to a mode-locked laser (MLL) over 4900 seconds with a measured peak-to-peak frequency deviation below 10 Hz.

Integrated visible light phased array system for autostereoscopic image projection.

We demonstrate a chip-scale autostereoscopic image projection system that utilizes a system of multiple integrated visible light optical phased arrays to reconstruct virtual light fields. Each phased array in this system serves as a micro-projector that illuminates the desired virtual object from a different angle. This recreates the virtual object in space with continuous parallax observable by the human visual system. In this work, a static virtual image with horizontal parallax and a viewing angle of 5° was generated with an array of 16 integrated silicon nitride phased arrays with a 635 nm operating wavelength. Each phased array is comprised of 32×32 optical antennas with passively encoded relative phases. The presented device demonstrates the promise of integrated visible light phased array platforms for implementing projection-based autostereoscopic displays in compact chip-scale platforms suitable for mobile devices.

Ultra-narrow-linewidth Al2O3:Er3+ lasers with a wavelength-insensitive waveguide design on a wafer-scale silicon nitride platform.

We report ultra-narrow-linewidth erbium-doped aluminum oxide (Al2O3:Er3+) distributed feedback (DFB) lasers with a wavelength-insensitive silicon-compatible waveguide design. The waveguide consists of five silicon nitride (SiNx) segments buried under silicon dioxide (SiO2) with a layer Al2O3:Er3+ deposited on top. This design has a high confinement factor (> 85%) and a near perfect (> 98%) intensity overlap for an octave-spanning range across near infra-red wavelengths (950-2000 nm). We compare the performance of DFB lasers in discrete quarter phase shifted (QPS) cavity and distributed phase shifted (DPS) cavity. Using QPS-DFB configuration, we obtain maximum output powers of 0.41 mW, 0.76 mW, and 0.47 mW at widely spaced wavelengths within both the C and L bands of the erbium gain spectrum (1536 nm, 1566 nm, and 1596 nm). In a DPS cavity, we achieve an order of magnitude improvement in maximum output power (5.43 mW) and a side mode suppression ratio (SMSR) of > 59.4 dB at an emission wavelength of 1565 nm. We observe an ultra-narrow linewidth of ΔνDPS = 5.3 ± 0.3 kHz for the DPS-DFB laser, as compared to ΔνQPS = 30.4 ± 1.1 kHz for the QPS-DFB laser, measured by a recirculating self-heterodyne delayed interferometer (R-SHDI).

Monolithically-integrated distributed feedback laser compatible with CMOS processing.

An optically-pumped, integrated distributed feedback laser is demonstrated using a CMOS compatible process, where a record-low-temperature deposited gain medium enables integration with active devices such as modulators and detectors. A pump threshold of 24.9 mW and a slope efficiency of 1.3 % is demonstrated at the lasing wavelength of 1552.98 nm. The rare-earth-doped aluminum oxide, used as the gain medium in this laser, is deposited by a substrate-bias-assisted reactive sputtering process. This process yields optical quality films with 0.1 dB/cm background loss at the deposition temperature of 250 °C, and therefore is fully compatible as a back-end-of-line CMOS process. The aforementioned laser's performance is comparable to previous lasers having gain media fabricated at much higher temperatures (> 550 °C). This work marks a crucial step towards monolithic integration of amplifiers and lasers in silicon microphotonic systems.

Unidirectional waveguide grating antennas with uniform emission for optical phased arrays.

We demonstrate millimeter-scale optical waveguide grating antennas with unidirectional emission for integrated optical phased arrays. Unidirectional emission eliminates the fundamental problem of blind spots in the element factor of a phased array caused by reflections of antenna radiation within the substrate. Over 90% directionality is demonstrated using a design consisting of two silicon nitride layers. Furthermore, the perturbation strength along the antenna is apodized to achieve uniform emission for the first time, to the best of our knowledge, on a millimeter scale. This allows for a high effective aperture and receiving efficiency. The emission profile of the measured 3 mm long antenna has a standard deviation of 8.65% of the mean. These antennas are state of the art and will allow for integrated optical phased arrays with blind-spot-free high transmission output power and high receiving efficiency for LIDAR and free-space communication systems.

Integrated optical phased arrays for quasi-Bessel-beam generation.

Integrated optical phased arrays for generating quasi-Bessel beams are proposed and experimentally demonstrated in a CMOS-compatible platform. Owing to their elongated central beams, Bessel beams have applications in a range of fields, including multiparticle trapping and laser lithography. In this Letter, continuous Bessel theory is manipulated to formulate the phase and amplitude conditions necessary for generating free-space-propagating Bessel-Gauss beams using on-chip optical phased arrays. Discussion of the effects of select phased array parameters on the generated beam's figures of merit is included. A one-dimensional splitter-tree-based phased array architecture is modified to enable arbitrary passive control of the array's element phase and amplitude distributions. This architecture is used to experimentally demonstrate on-chip quasi-Bessel-beam generation with a ∼14 mm Bessel length and ∼30 µm power full width at half maximum.

Coherent solid-state LIDAR with silicon photonic optical phased arrays.

We present, to the best of our knowledge, the first demonstration of coherent solid-state light detection and ranging (LIDAR) using optical phased arrays in a silicon photonics platform. An integrated transmitting and receiving frequency-modulated continuous-wave circuit was initially developed and tested to confirm on-chip ranging. Simultaneous distance and velocity measurements were performed using triangular frequency modulation. Transmitting and receiving optical phased arrays were added to the system for on-chip beam collimation, and solid-state beam steering and ranging measurements using this system are shown. A cascaded optical phase shifter architecture with multiple groups was used to simplify system control and allow for a compact packaged device. This system was fabricated within a 300 mm wafer CMOS-compatible platform and paves the way for disruptive low-cost and compact LIDAR on-chip technology.

Wavelength division multiplexed light source monolithically integrated on a silicon photonics platform.

We demonstrate monolithic integration of a wavelength division multiplexed light source for silicon photonics by a cascade of erbium-doped aluminum oxide (Al2O3:Er3+) distributed feedback (DFB) lasers. Four DFB lasers with uniformly spaced emission wavelengths are cascaded in a series to simultaneously operate with no additional tuning required. A total output power of -10.9 dBm is obtained from the four DFBs with an average side mode suppression ratio of 38.1±2.5 dB. We characterize the temperature-dependent wavelength shift of the cascaded DFBs and observe a uniform dλ/dT of 0.02 nm/°C across all four lasers.

Mode-evolution-based coupler for high saturation power Ge-on-Si photodetectors.

We propose a mode-evolution-based coupler for high saturation power germanium-on-silicon photodetectors. This coupler uniformly illuminates the intrinsic germanium region of the detector, decreasing saturation effects, such as carrier screening, observed at high input powers. We demonstrate 70% more photocurrent generation (9.1-15.5 mA) and more than 40 times higher opto-electrical bandwidth (0.7-31 GHz) than conventional butt-coupled detectors under high-power illumination. The high-power and high-speed performance of the device, combined with the compactness of the coupling method, will enable new applications for integrated silicon photonics systems.

Large-scale silicon nitride nanophotonic phased arrays at infrared and visible wavelengths.

We demonstrate passive large-scale nanophotonic phased arrays in a CMOS-compatible silicon photonic platform. Silicon nitride waveguides are used to allow for higher input power and lower phase variation compared to a silicon-based distribution network. A phased array at an infrared wavelength of 1550 nm is demonstrated with an ultra-large aperture size of 4 mm×4 mm, achieving a record small and near diffraction-limited spot size of 0.021°×0.021° with a side lobe suppression of 10 dB. A main beam power of 400 mW is observed. Using the same silicon nitride platform and phased array architecture, we also demonstrate, to the best of our knowledge, the first large-aperture visible nanophotonic phased array at 635 nm with an aperture size of 0.5 mm×0.5 mm and a spot size of 0.064°×0.074°.

Whispering gallery germanium-on-silicon photodetector.

We design and demonstrate, to the best of our knowledge, the first whispering gallery germanium-on-silicon photodetector with evanescent coupling from a silicon bus waveguide in a CMOS-compatible process. The small footprint (63.6 µm2), high responsivity (∼1.04 A/W at 1530 nm), low bias voltage (-1 V), low dark current (2.03 nA), and large optoelectric bandwidth (32.9 GHz) of the detector enable simultaneous wavelength filtering and power detection, ideal for handling large network data traffic. In addition, with the resonant nature of the detector, we also optimize the design to enable long-wavelength detection, achieving a separate device with a detection range of up to 1630 nm with a >0.45 A/W responsivity, making it an important building block for optical communication networks.

High-power thulium lasers on a silicon photonics platform.

Mid-infrared laser sources are of great interest for various applications, including light detection and ranging, spectroscopy, communication, trace-gas detection, and medical sensing. Silicon photonics is a promising platform that enables these applications to be integrated on a single chip with low cost and compact size. Silicon-based high-power lasers have been demonstrated at 1.55 µm wavelength, while in the 2 µm region, to the best of our knowledge, high-power, high-efficiency, and monolithic light sources have been minimally investigated. In this Letter, we report on high-power CMOS-compatible thulium-doped distributed feedback and distributed Bragg reflector lasers with single-mode output powers up to 267 and 387 mW, and slope efficiencies of 14% and 23%, respectively. More than 70 dB side-mode suppression ratio is achieved for both lasers. This work extends the applicability of silicon photonic microsystems in the 2 µm region.

C-band swept wavelength erbium-doped fiber laser with a high-Q tunable interior-ridge silicon microring cavity.

We demonstrate swept-wavelength operation of an erbium-doped fiber laser using a tunable silicon microring cavity. The microring cavity is designed to have 35 nm free spectral range, a high Q of 1.5 × 105, and low insertion loss of <0.05 dB. The resonance wavelength of the cavity is tuned efficiently (8.1µW/GHz) and rapidly (τr,f~2.2µs) using an embedded Si heater. The laser achieves single-mode continuous-wave emission over the C-band (1530 nm-to-1560 nm). A mean swept-wavelength rate of 22,600 nm/s or 3106 THz/s is demonstrated within 1532 nm-to-1542 nm wavelength range. Its linewidth is measured to be 16 kHz using loss-compensated circulating delayed self-heterodyne detection.

Ultra-compact and low-threshold thulium microcavity laser monolithically integrated on silicon.

We demonstrate an ultra-compact and low-threshold thulium microcavity laser that is monolithically integrated on a silicon chip. The integrated microlaser consists of an active thulium-doped aluminum oxide microcavity beside a passive silicon nitride bus waveguide, which enables on-chip pump-input and laser-output coupling. We observe lasing in the wavelength range of 1.8-1.9 µm under 1.6 µm resonant pumping and at varying waveguide-microcavity gap sizes. The microlaser exhibits a threshold as low as 773 µW (226 µW) and a slope efficiency as high as 24% (48%) with respect to the pump power coupled into the silicon nitride bus waveguide (microcavity). Its small footprint, minimal energy consumption, high efficiency, and silicon compatibility demonstrate that on-chip thulium lasers are promising light sources for silicon microphotonic systems.