A simplified fabrication process of Fresnel zone plates with controlling proximity effect correction.

Fresnel zone plates (FZPs) for soft X-ray microscopy with an energy range of 284 eV to 540 eV are designed and fabricated in a simple method. An adequate aspect ratio of the resist mold for electroplating was obtained by the proximity effect correction technology for an incident electron beam on a single thick layer resist. Without additional complicated reactive ion etching, a sufficient electro plating mold for nickel structures was fabricated. The overall fabrication procedures which involve a mix-and-match overlay technique for electron beam lithography and an optic exposure system that centers the membrane on the nanostructures, and hybrid silicon etching technology in junction with deep anisotropy and a KOH wet method in order to release the backside Si substrates of the Si3N4 membranes with no deformation of FZPs are introduced. High quality nanostructures with minimum outermost zone widths of 50 nm and diameters of 120 microm were fabricated with simplified fabrication process and with cost-effective.

Optically Patternable Metamaterial Below Diffraction Limit.

We report an optically patternable metamaterial (OPM) for ultraviolet nanolithography below the diffraction limit. The OPM features monolayered silver nanoislands embedded within a photosensitive polymer by using spin-coating of an ultrathin polymer, oblique angle deposition, and solid-state embedment of silver nanoislands. This unique configuration simultaneously exhibits both negative effective permittivity and high image contrast in the ultraviolet range, which enables the surface plasmon excitation for the clear photolithographic definition of minimum feature size of 70 nm (≲ λ/5) beyond the near-field zone. This new metamaterial provides a new class of photoresist for ultraviolet nanolithography below the diffraction limit.

Soft x-ray microscope constructed with a PMMA phase-reversal zone plate.

A soft x-ray microscope based on a phase-reversal zone plate was constructed and tested using high harmonic radiation as a coherent light source. The 61st harmonic centered at 13.3 nm was optimized in spectral sharpness and intensity by controlling the incident laser energy and chirp. A phase-reversal zone plate made of polymethyl methacrylate more than doubled the first-order efficiency. The nano patterns, imaged on an x-ray CCD with a magnification of 650, showed that the measured resolution of the microscope was better than 100 nm.