Nucleation, Growth Mechanism, and Controlled Coating of ZnO ALD onto Vertically Aligned N-Doped CNTs.

Silva, R M; Ferro, M C; Araujo, J R; Achete, C A; Clavel, G; Silva, R F; Pinna, N

Silva, R M; Ferro, M C; Araujo, J R; Achete, C A; Clavel, G; Silva, R F; Pinna, N.

Afiliación

Silva RM; Department of Materials and Ceramic Engineering, CICECO, University of Aveiro , 3810-193 Aveiro, Portugal.
Ferro MC; Institut für Chemie, Humboldt-Universität zu Berlin , Brook-Taylor-Str. 2, 12489 Berlin, Germany.
Araujo JR; Department of Materials and Ceramic Engineering, CICECO, University of Aveiro , 3810-193 Aveiro, Portugal.
Achete CA; Materials Metrology Division, INMETRO , 25250-020, Duque de Caxias, RJ, Brazil.
Clavel G; Materials Metrology Division, INMETRO , 25250-020, Duque de Caxias, RJ, Brazil.
Silva RF; Programa de Engenharia Metalurgica e de Materiais, COPPE-UFRJ Rio de Janeiro , CP68501, 21945 Rio de Janeiro, RJ, Brazil.
Pinna N; Institut für Chemie, Humboldt-Universität zu Berlin , Brook-Taylor-Str. 2, 12489 Berlin, Germany.

Langmuir ; 32(28): 7038-44, 2016 07 19.

Article en En | MEDLINE | ID: mdl-27333190

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Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Langmuir Asunto de la revista: QUIMICA Año: 2016 Tipo del documento: Article País de afiliación: Portugal

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