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Four-Bits-Per-Cell Operation in an HfO2 -Based Resistive Switching Device.
Kim, Gun Hwan; Ju, Hyunsu; Yang, Min Kyu; Lee, Dong Kyu; Choi, Ji Woon; Jang, Jae Hyuck; Lee, Sang Gil; Cha, Ik Su; Park, Bo Keun; Han, Jeong Hwan; Chung, Taek-Mo; Kim, Kyung Min; Hwang, Cheol Seong; Lee, Young Kuk.
Afiliación
  • Kim GH; Center for Thin-Film Materials, Korea Research Institute of Chemical Technology (KRICT), 141 Gajeong-Ro, Yuseong-Gu, Daejeon, 34114, Republic of Korea.
  • Ju H; Center for Opto-Electronic Materials and Devices, Post-Silicon Semiconductor Institute, Korea Institute of Science and Technology (KIST), Seoul, 02792, Republic of Korea.
  • Yang MK; School of Electrical and Electronics Engineering, Yonsei University, 262 Seongsanno, Seodaemun-gu, Seoul, 120-749, Republic of Korea.
  • Lee DK; Department of Materials Science and Engineering, Yonsei University, 262 Seongsanno, Seodaemun-gu, Seoul, 120-749, Republic of Korea.
  • Choi JW; Center for Thin-Film Materials, Korea Research Institute of Chemical Technology (KRICT), 141 Gajeong-Ro, Yuseong-Gu, Daejeon, 34114, Republic of Korea.
  • Jang JH; Center for Electron Microscopy Research, Korea Basic Science Institute (KBSI), 169-148 Gwahak-ro, Yuseong-gu, Daejeon, 34133, Republic of Korea.
  • Lee SG; Center for Electron Microscopy Research, Korea Basic Science Institute (KBSI), 169-148 Gwahak-ro, Yuseong-gu, Daejeon, 34133, Republic of Korea.
  • Cha IS; Center for Opto-Electronic Materials and Devices, Post-Silicon Semiconductor Institute, Korea Institute of Science and Technology (KIST), Seoul, 02792, Republic of Korea.
  • Park BK; Center for Thin-Film Materials, Korea Research Institute of Chemical Technology (KRICT), 141 Gajeong-Ro, Yuseong-Gu, Daejeon, 34114, Republic of Korea.
  • Han JH; Center for Thin-Film Materials, Korea Research Institute of Chemical Technology (KRICT), 141 Gajeong-Ro, Yuseong-Gu, Daejeon, 34114, Republic of Korea.
  • Chung TM; Center for Thin-Film Materials, Korea Research Institute of Chemical Technology (KRICT), 141 Gajeong-Ro, Yuseong-Gu, Daejeon, 34114, Republic of Korea.
  • Kim KM; Hewlett Packard Labs, Hewlett Packard Enterprise, Palo Alto, CA, 94304, USA.
  • Hwang CS; Department of Materials Science and Engineering and Inter-University Semiconductor Research Center, College of Engineering, Seoul National University, Seoul, 08826, Republic of Korea.
  • Lee YK; Center for Thin-Film Materials, Korea Research Institute of Chemical Technology (KRICT), 141 Gajeong-Ro, Yuseong-Gu, Daejeon, 34114, Republic of Korea.
Small ; 13(40)2017 10.
Article en En | MEDLINE | ID: mdl-28857422
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Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Small Asunto de la revista: ENGENHARIA BIOMEDICA Año: 2017 Tipo del documento: Article
Texto completo
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PubMed Links
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Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Small Asunto de la revista: ENGENHARIA BIOMEDICA Año: 2017 Tipo del documento: Article