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Photoabsorption Imaging at Nanometer Scales Using Secondary Electron Analysis.
Zhang, Ze; Martis, Joel; Xu, Xintong; Li, Hao-Kun; Xie, Chenlu; Takasuka, Brad; Lee, Jonghoon; Roy, Ajit K; Majumdar, Arun.
Afiliación
  • Zhang Z; Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States.
  • Martis J; Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States.
  • Xu X; Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States.
  • Li HK; Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States.
  • Xie C; Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States.
  • Takasuka B; Silicon Valley Peripherals Inc., San Jose, California 95117, United States.
  • Lee J; Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, WPAFB, Ohio 45433, United States.
  • Roy AK; Materials and Manufacturing Directorate, Air Force Research Laboratory, Wright-Patterson Air Force Base, WPAFB, Ohio 45433, United States.
  • Majumdar A; Department of Mechanical Engineering, Stanford University, Stanford, California 94305, United States.
Nano Lett ; 21(5): 1935-1942, 2021 03 10.
Article en En | MEDLINE | ID: mdl-33635654
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Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Nano Lett Año: 2021 Tipo del documento: Article País de afiliación: Estados Unidos
Texto completo
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PubMed Links
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Texto completo: 1 Colección: 01-internacional Banco de datos: MEDLINE Idioma: En Revista: Nano Lett Año: 2021 Tipo del documento: Article País de afiliación: Estados Unidos