O3-Annealing Effect on the Etching Resilience of a TiO2/Al2O3 filter Prepared by Atomic Layer Deposition.
ACS Appl Mater Interfaces
; 15(34): 40942-40953, 2023 Aug 30.
Article
en En
| MEDLINE
| ID: mdl-37590996
ABSTRACT
This research investigates the improvements of ozone (O3) annealing on the optical and etching characteristics of TiO2/Al2O3 multilayer band-pass filters designed for potential optoelectronic applications. The band-pass filters were fabricated using atomic layer deposition (ALD), and their performance was systematically analyzed after the addition of O3 annealing at moderate temperatures (up to 300 °C). Results reveal that O3 annealing improves the optical transmittance of the multilayers by approximately 40% without significant spectral changes (â¼6 nm). The observed enhancement in the transmittance is attributed to the improved stoichiometry of TiO2. By filling in the oxygen vacancies created during the fabrication process, it reduces its extinction coefficient. Furthermore, the O3 annealing enhances the stability of TiO2 against wet etching, improving the uniformity of etched surfaces. Etching on the ozone-annealed multilayer was up to 8 times more homogeneous, as observed in the roughness. The relatively short duration of the O3 annealing process, approximately 1.6 h, makes it a cost-effective alternative compared to using ozone in the ALD process, which can last several hours for thick optical coatings.
Texto completo:
1
Colección:
01-internacional
Banco de datos:
MEDLINE
Idioma:
En
Revista:
ACS Appl Mater Interfaces
Asunto de la revista:
BIOTECNOLOGIA
/
ENGENHARIA BIOMEDICA
Año:
2023
Tipo del documento:
Article