Comparison between the electrical properties of ZnO nanowires based field effect transistors fabricated by back- and top-gate approaches.
J Nanosci Nanotechnol
; 8(11): 6010-6, 2008 Nov.
Article
em En
| MEDLINE
| ID: mdl-19198339
ABSTRACT
Large-quality, well-crystallized growth of ZnO nanowires was done via non-catalytic thermal evaporation process on silicon substrate only by using metallic zinc powder and oxygen as source materials for zinc and oxygen, respectively. The electrical properties of the as-grown ZnO nanowires were examined by fabricating a single nanowire based FETs which were fabricated via two approaches, i.e., back- and top-gate approaches by using electron beam lithography (EBL) and photolithography processes. ZnO FETs electrical properties were characterized by I(DS)-V(DS) and I(DS)-V(GS) measurement. The fabricated single ZnO nanowire based FETs by back- and top-gate approaches exhibited field effect mobilities of approximately 4.25 and approximately 12.76 cm2/Vs, respectively. Moreover, the carrier concentrations for the fabricated back- and top-gate FETs were approximately 1.6 x 10(17) and approximately 1.37 x 10(18) cm(-3), respectively. From our studies it was observed that the fabricated top-gate FETs exhibited higher and good electrical properties as compared to ZnO nanowire FETs fabricated using back-gate approaches.
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Coleções:
01-internacional
Base de dados:
MEDLINE
Assunto principal:
Transistores Eletrônicos
/
Óxido de Zinco
/
Cristalização
/
Nanotecnologia
/
Nanotubos
/
Microeletrodos
Tipo de estudo:
Evaluation_studies
Idioma:
En
Revista:
J Nanosci Nanotechnol
Ano de publicação:
2008
Tipo de documento:
Article
País de afiliação:
Coréia do Sul