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Atomic Layer Deposition of Al2O3 on WSe2 Functionalized by Titanyl Phthalocyanine.
Park, Jun Hong; Fathipour, Sara; Kwak, Iljo; Sardashti, Kasra; Ahles, Christopher F; Wolf, Steven F; Edmonds, Mary; Vishwanath, Suresh; Xing, Huili Grace; Fullerton-Shirey, Susan K; Seabaugh, Alan; Kummel, Andrew C.
Afiliação
  • Fathipour S; Department of Electrical Engineering, University of Notre Dame , Notre Dame, Indiana 46556, United States.
  • Vishwanath S; Department of Electrical Engineering, University of Notre Dame , Notre Dame, Indiana 46556, United States.
  • Xing HG; Department of Electrical Engineering, University of Notre Dame , Notre Dame, Indiana 46556, United States.
  • Fullerton-Shirey SK; Department of Chemical and Petroleum Engineering, University of Pittsburgh , Pittsburgh, Pennsylvania 15213, United States.
  • Seabaugh A; Department of Electrical Engineering, University of Notre Dame , Notre Dame, Indiana 46556, United States.
ACS Nano ; 10(7): 6888-96, 2016 07 26.
Article em En | MEDLINE | ID: mdl-27305595
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: ACS Nano Ano de publicação: 2016 Tipo de documento: Article
Texto completo
Imprimir
XML
PubMed Links
Buscar no Google

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: ACS Nano Ano de publicação: 2016 Tipo de documento: Article