Direct atomic fabrication and dopant positioning in Si using electron beams with active real-time image-based feedback.

Jesse, Stephen; Hudak, Bethany M; Zarkadoula, Eva; Song, Jiaming; Maksov, Artem; Fuentes-Cabrera, Miguel; Ganesh, Panchapakesan; Kravchenko, Ivan; Snijders, Panchapakesan C; Lupini, Andrew R; Borisevich, Albina Y; Kalinin, Sergei V

Jesse, Stephen; Hudak, Bethany M; Zarkadoula, Eva; Song, Jiaming; Maksov, Artem; Fuentes-Cabrera, Miguel; Ganesh, Panchapakesan; Kravchenko, Ivan; Snijders, Panchapakesan C; Lupini, Andrew R; Borisevich, Albina Y; Kalinin, Sergei V.

Afiliação

Jesse S; The Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831, United States of America. The Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, TN 37831, United States of America.

Nanotechnology ; 29(25): 255303, 2018 Jun 22.

Article em En | MEDLINE | ID: mdl-29616980

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nanotechnology Ano de publicação: 2018 Tipo de documento: Article País de afiliação: Estados Unidos

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