Understanding the Mechanism of Electronic Defect Suppression Enabled by Nonidealities in Atomic Layer Deposition.

Kavrik, Mahmut Sami; Bostwick, Aaron; Rotenberg, Eli; Tang, Kechao; Thomson, Emily; Aoki, Toshihiro; Fruhberger, Bernd; Taur, Yuan; McIntyre, Paul C; Kummel, Andrew C

Kavrik, Mahmut Sami; Bostwick, Aaron; Rotenberg, Eli; Tang, Kechao; Thomson, Emily; Aoki, Toshihiro; Fruhberger, Bernd; Taur, Yuan; McIntyre, Paul C; Kummel, Andrew C.

Afiliação

Kavrik MS; Materials Science and Engineering , University of California San Diego , La Jolla , California 92093 , United States.
Bostwick A; Advanced Light Source (ALS) , E. O. Lawrence Berkeley Laboratory , Berkeley , California United States.
Rotenberg E; Advanced Light Source (ALS) , E. O. Lawrence Berkeley Laboratory , Berkeley , California United States.
Tang K; Materials Science and Engineering , Stanford University , Stanford , California 94305 , United States.
Thomson E; Materials Science and Engineering , University of California San Diego , La Jolla , California 92093 , United States.
Aoki T; Irvine Materials Research Institute , University of California Irvine , Irvine , California , United States.
Fruhberger B; California Institute for Telecommunications and Information Technology , University of California San Diego , La Jolla , California 92093 , United States.
Taur Y; Materials Science and Engineering , University of California San Diego , La Jolla , California 92093 , United States.
McIntyre PC; Materials Science and Engineering , Stanford University , Stanford , California 94305 , United States.
Kummel AC; Materials Science and Engineering , University of California San Diego , La Jolla , California 92093 , United States.

J Am Chem Soc ; 142(1): 134-145, 2020 Jan 08.

Article em En | MEDLINE | ID: mdl-31779305

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: J Am Chem Soc Ano de publicação: 2020 Tipo de documento: Article País de afiliação: Estados Unidos

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