Patterning of graphene using wet etching with hypochlorite and UV light.

Zhang, Minfang; Yang, Mei; Okigawa, Yuki; Yamada, Takatoshi; Nakajima, Hideaki; Iizumi, Yoko; Okazaki, Toshiya

Zhang, Minfang; Yang, Mei; Okigawa, Yuki; Yamada, Takatoshi; Nakajima, Hideaki; Iizumi, Yoko; Okazaki, Toshiya.

Afiliação

Zhang M; CNT Application Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Higashi 1-1-1, Tsukuba, Japan. m-zhang@aist.go.jp.
Yang M; CNT Application Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Higashi 1-1-1, Tsukuba, Japan.
Okigawa Y; Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Higashi 1-1-1, Tsukuba, Japan.
Yamada T; Nanomaterials Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Higashi 1-1-1, Tsukuba, Japan. takatoshi-yamada@aist.go.jp.
Nakajima H; CNT Application Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Higashi 1-1-1, Tsukuba, Japan.
Iizumi Y; CNT Application Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Higashi 1-1-1, Tsukuba, Japan.
Okazaki T; CNT Application Research Center, National Institute of Advanced Industrial Science and Technology (AIST), Higashi 1-1-1, Tsukuba, Japan. toshi-okazaki@aist.go.jp.

Sci Rep ; 12(1): 4541, 2022 Mar 16.

Article em En | MEDLINE | ID: mdl-35296771

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Sci Rep Ano de publicação: 2022 Tipo de documento: Article País de afiliação: Japão

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