Identification of a gene, SOO1, which complements osmo-sensitivity and defect in in vitro beta1,3-glucan synthase activity in Saccharomyces cerevisiae.

The soo1-1 (for suppressor of osmo-sensitivity) mutation results in a temperature-dependent osmo-sensitive phenotype at non-permissive temperature (37 degrees C), makes yeast cells more susceptible to Zymolyase and affects in vitro beta1,3-glucan synthase activity level. Transformation of soo1-1 mutant by SOO1 gene reverses these effects. Nucleotide sequencing of SOO1 revealed that this gene is identical to the recently reported alpha-COP that is involved in the intracellular protein translocation from endoplasmic reticulum to Golgi and vice versa. Although the soo1-1 mutant strain showed osmotically remediable growth at 37 degrees C, SOO1 disruptants could not grow in any culture conditions. Analysis of cell wall fractions revealed that the soo1-1 mutation causes a decrease in in vitro beta1,3-glucan synthase activity, and, thus, a subsequent alteration of the cell wall composition.

Development of a natural preservative system using the mixture of chitosan-Inula helenium L. extract.

The aim of this study was to develop a new natural preservative system making up for the weak points of chitosan as a preservative. As reported in a previous manuscript (20th IFSCC Congress, Cannes, France, 1998), the minimum inhibitory concentrations (MICs) of water-soluble chitosan against bacteria and yeast were 0.9-3.0 mg mL(-1), whereas MICs of chitosan against Aspergillus niger were over 5.0 mg mL(-1). However, the result of recent study showed that the MICs of Inula helenium L. extract against A. niger were below 1.0 mg mL(-1). Thus, we could develop a new preservative system containing both chitosan and I. helenium L. extract named CI-mixture. MICs of CI-mixture against bacteria and fungi (yeast and mould) were 2.0-4.0 mg mL(-1). When 10.0% of the mixture (the ratio of chitosan to I. helenium L. extract = 7.5% : 2.5%) was applied to cosmetic formulae such as skin lotion, milk lotion, cream and pack, it revealed appropriate preservative efficacy. Our result of the patch test also showed that this preservative system reduced skin irritation by about 30-50%, as compared to the organic preservative system. Therefore, the good natural preservative system including chitosan and Inula helenium L. extract could be incorporated in cosmetic formulations.