Self assembly of nano metric metallic particles for realization of photonic and electronic nano transistors.

In this paper, we present the self assembly procedure as well as experimental results of a novel method for constructing well defined arrangements of self assembly metallic nano particles into sophisticated nano structures. The self assembly concept is based on focused ion beam (FIB) technology, where metallic nano particles are self assembled due to implantation of positive gallium ions into the insulating material (e.g., silica as in silicon on insulator wafers) that acts as intermediary layer between the substrate and the negatively charge metallic nanoparticles.

All-optical nano modulator on a silicon chip.

We present an all-optical modulator realized on a silicon chip. The proposed modulator has nano scale dimensions and a high extinction ratio. Its operation principle is based on a spatially non-uniform variation of the absorption of a miniaturized, silicon waveguide - based Mach-Zehnder interferometer (MZI). The absorption variation is obtained by illuminating the MZI with visible light. Our modulator may be used as an interfacing link between microelectronic processing circuits and optical information transmission links. We provide details on the fabrication and the experimental characterization of the suggested device. Since the operation principle is not based on a high Finesse resonator, the modulator is less sensitive to wavelength changes and its operation rate is not connected to the time required for the optical response to reach steady state but rather to material related effects.

Transverse resolution improvement using rotating-grating time-multiplexing approach.

The ability to improve the limited resolving power of optical imaging systems while approaching the theoretical diffraction limit has been an attractive discipline with growing interest over the last years due to its benefits in many applied optics systems. This paper presents a new approach to achieve transverse superresolution in far-field imaging systems, with direct application in both digital microscopy and digital holographic microscopy. Theoretical analysis and computer simulations show the validity of the presented approach.