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Tuning Electrical Conductance of MoS2 Monolayers through Substitutional Doping.
Gao, Hui; Suh, Joonki; Cao, Michael C; Joe, Andrew Y; Mujid, Fauzia; Lee, Kan-Heng; Xie, Saien; Poddar, Preeti; Lee, Jae-Ung; Kang, Kibum; Kim, Philip; Muller, David A; Park, Jiwoong.
Afiliação
  • Gao H; Department of Chemistry and Chemical Biology, Cornell University, Ithaca, New York 14853, United States.
  • Suh J; Department of Chemistry, Pritzker School of Molecular Engineering, and James Frank Institute, University of Chicago, Chicago, Illinois 60637, United States.
  • Cao MC; Department of Chemistry, Pritzker School of Molecular Engineering, and James Frank Institute, University of Chicago, Chicago, Illinois 60637, United States.
  • Joe AY; School of Materials Science and Engineering, Ulsan National Institute of Science and Technology (UNIST), Ulsan 44919, Korea.
  • Mujid F; School of Applied and Engineering Physics, Cornell University, Ithaca, New York 14853, United States.
  • Lee KH; Department of Physics, Harvard University, Cambridge, Massachusetts 02138, United States.
  • Xie S; Department of Chemistry, Pritzker School of Molecular Engineering, and James Frank Institute, University of Chicago, Chicago, Illinois 60637, United States.
  • Poddar P; Department of Chemistry, Pritzker School of Molecular Engineering, and James Frank Institute, University of Chicago, Chicago, Illinois 60637, United States.
  • Lee JU; School of Applied and Engineering Physics, Cornell University, Ithaca, New York 14853, United States.
  • Kang K; Department of Chemistry, Pritzker School of Molecular Engineering, and James Frank Institute, University of Chicago, Chicago, Illinois 60637, United States.
  • Kim P; School of Applied and Engineering Physics, Cornell University, Ithaca, New York 14853, United States.
  • Muller DA; Department of Chemistry, Pritzker School of Molecular Engineering, and James Frank Institute, University of Chicago, Chicago, Illinois 60637, United States.
  • Park J; Department of Chemistry, Pritzker School of Molecular Engineering, and James Frank Institute, University of Chicago, Chicago, Illinois 60637, United States.
Nano Lett ; 20(6): 4095-4101, 2020 Jun 10.
Article em En | MEDLINE | ID: mdl-32396734
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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nano Lett Ano de publicação: 2020 Tipo de documento: Article País de afiliação: Estados Unidos
Texto completo
Imprimir
XML
PubMed Links
Buscar no Google

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nano Lett Ano de publicação: 2020 Tipo de documento: Article País de afiliação: Estados Unidos