Superconducting Contact Geometries for Next-Generation Quantized Hall Resistance Standards.

Panna, Alireza R; Kruskopf, Mattias; Rigosi, Albert F; Marzano, Martina; Patel, Dinesh K; Payagala, Shamith U; Jarrett, Dean G; Newell, David B; Elmquist, Randolph E

Panna, Alireza R; Kruskopf, Mattias; Rigosi, Albert F; Marzano, Martina; Patel, Dinesh K; Payagala, Shamith U; Jarrett, Dean G; Newell, David B; Elmquist, Randolph E.

Afiliação

Panna AR; National Institute of Standards and Technology, 100 Bureau Drive, Stop 8171, Gaithersburg, MD, 20899, USA.
Kruskopf M; National Institute of Standards and Technology, 100 Bureau Drive, Stop 8171, Gaithersburg, MD, 20899, USA.
Rigosi AF; Physikalisch-Technische Bundesanstalt, Department of Electrical Quantum Metrology, Braunschweig, 38116, Germany.
Marzano M; National Institute of Standards and Technology, 100 Bureau Drive, Stop 8171, Gaithersburg, MD, 20899, USA.
Patel DK; National Institute of Standards and Technology, 100 Bureau Drive, Stop 8171, Gaithersburg, MD, 20899, USA.
Payagala SU; Istituto Nazionale Di Ricerca Metrologica, Torino 10135, Italy.
Jarrett DG; National Institute of Standards and Technology, 100 Bureau Drive, Stop 8171, Gaithersburg, MD, 20899, USA.
Newell DB; National Institute of Standards and Technology, 100 Bureau Drive, Stop 8171, Gaithersburg, MD, 20899, USA.
Elmquist RE; National Institute of Standards and Technology, 100 Bureau Drive, Stop 8171, Gaithersburg, MD, 20899, USA.

IEEE Trans Instrum Meas ; 1.633481E62020.

Article em En | MEDLINE | ID: mdl-33335333

Palavras-chave

epitaxial graphene; multi-series electrical contacts; quantized Hall resistance standards; quantum Hall effect

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: IEEE Trans Instrum Meas Ano de publicação: 2020 Tipo de documento: Article País de afiliação: Estados Unidos

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