Bottom-Up Nanofabrication with Extreme-Ultraviolet Light: Metal-Organic Frameworks on Patterned Monolayers.

Lugier, O; Thakur, N; Wu, L; Vockenhuber, M; Ekinci, Y; Castellanos, S

Lugier, O; Thakur, N; Wu, L; Vockenhuber, M; Ekinci, Y; Castellanos, S.

Afiliação

Lugier O; Advanced Research Center for Nanolithography, Science Park 106, 1098XG Amsterdam, The Netherlands.
Thakur N; Advanced Research Center for Nanolithography, Science Park 106, 1098XG Amsterdam, The Netherlands.
Wu L; Advanced Research Center for Nanolithography, Science Park 106, 1098XG Amsterdam, The Netherlands.
Vockenhuber M; Paul Scherrer Institute, Forschungstrasse 111, 5232 Villigen, Switzerland.
Ekinci Y; Paul Scherrer Institute, Forschungstrasse 111, 5232 Villigen, Switzerland.
Castellanos S; Advanced Research Center for Nanolithography, Science Park 106, 1098XG Amsterdam, The Netherlands.

ACS Appl Mater Interfaces ; 13(36): 43777-43786, 2021 Sep 15.

Article em En | MEDLINE | ID: mdl-34463483

Palavras-chave

EUV lithography; HKUST; SURMOF growth; nanopatterns; self-assembled monolayers

Texto completo

Imprimir

XML

PubMed Links

Buscar no Google

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: ACS Appl Mater Interfaces Assunto da revista: BIOTECNOLOGIA / ENGENHARIA BIOMEDICA Ano de publicação: 2021 Tipo de documento: Article País de afiliação: Holanda

Texto completo

Imprimir

XML

PubMed Links

Buscar no Google