Role of Oxygen Source on Buried Interfaces in Atomic-Layer-Deposited Ferroelectric Hafnia-Zirconia Thin Films.

Hsain, Hanan Alexandra; Lee, Younghwan; Lancaster, Suzanne; Materano, Monica; Alcala, Ruben; Xu, Bohan; Mikolajick, Thomas; Schroeder, Uwe; Parsons, Gregory N; Jones, Jacob L

Hsain, Hanan Alexandra; Lee, Younghwan; Lancaster, Suzanne; Materano, Monica; Alcala, Ruben; Xu, Bohan; Mikolajick, Thomas; Schroeder, Uwe; Parsons, Gregory N; Jones, Jacob L.

Afiliação

Hsain HA; Materials Science and Engineering Department, North Carolina State University, 911 Partners Way, Raleigh, North Carolina 27695, United States.
Lee Y; NaMLab gGmbH, Nöthnitzer Strasse 64a, 01187 Dresden, Germany.
Lancaster S; Materials Science and Engineering Department, North Carolina State University, 911 Partners Way, Raleigh, North Carolina 27695, United States.
Materano M; NaMLab gGmbH, Nöthnitzer Strasse 64a, 01187 Dresden, Germany.
Alcala R; NaMLab gGmbH, Nöthnitzer Strasse 64a, 01187 Dresden, Germany.
Xu B; NaMLab gGmbH, Nöthnitzer Strasse 64a, 01187 Dresden, Germany.
Mikolajick T; NaMLab gGmbH, Nöthnitzer Strasse 64a, 01187 Dresden, Germany.
Schroeder U; NaMLab gGmbH, Nöthnitzer Strasse 64a, 01187 Dresden, Germany.
Parsons GN; TU Dresden, Chair of Nanoelectronics, Nöthnitzer Strasse 64a, 01187 Dresden, Germany.
Jones JL; NaMLab gGmbH, Nöthnitzer Strasse 64a, 01187 Dresden, Germany.

ACS Appl Mater Interfaces ; 14(37): 42232-42244, 2022 Sep 21.

Article em En | MEDLINE | ID: mdl-36069477

Palavras-chave

Hf0.5Zr0.5O2; ferroelectric; hafnia; orthorhombic; oxygen; texture; zirconia

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: ACS Appl Mater Interfaces Assunto da revista: BIOTECNOLOGIA / ENGENHARIA BIOMEDICA Ano de publicação: 2022 Tipo de documento: Article País de afiliação: Estados Unidos

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