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Damage protection from focused ion beam process toward nanocavity-implemented compound semiconductor nanowire lasers.
Takiguchi, Masato; Zhang, Guoqiang; Sasaki, Satoshi; Tateno, Kouta; John, Caleb; Ono, Masaaki; Sumikura, Hisashi; Shinya, Akihiko; Notomi, Masaya.
Afiliação
  • Takiguchi M; Nanophotonics Center, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan.
  • Zhang G; NTT Basic Research Laboratories, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan.
  • Sasaki S; Nanophotonics Center, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan.
  • Tateno K; NTT Basic Research Laboratories, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan.
  • John C; NTT Basic Research Laboratories, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan.
  • Ono M; Nanophotonics Center, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan.
  • Sumikura H; NTT Basic Research Laboratories, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan.
  • Shinya A; NTT Basic Research Laboratories, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan.
  • Notomi M; Nanophotonics Center, NTT Corp., 3-1, Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan.
Nanotechnology ; 34(13)2023 Jan 20.
Article em En | MEDLINE | ID: mdl-36608329

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nanotechnology Ano de publicação: 2023 Tipo de documento: Article País de afiliação: Japão

Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nanotechnology Ano de publicação: 2023 Tipo de documento: Article País de afiliação: Japão