Applications of remote epitaxy and van der Waals epitaxy.

Roh, Ilpyo; Goh, Seok Hyeon; Meng, Yuan; Kim, Justin S; Han, Sangmoon; Xu, Zhihao; Lee, Han Eol; Kim, Yeongin; Bae, Sang-Hoon

Roh, Ilpyo; Goh, Seok Hyeon; Meng, Yuan; Kim, Justin S; Han, Sangmoon; Xu, Zhihao; Lee, Han Eol; Kim, Yeongin; Bae, Sang-Hoon.

Afiliação

Roh I; Mechanical Engineering & Materials Science, Washington University in St. Louis, Saint Louis, MO, 63105, USA.
Goh SH; R&D CENTER, M.O.P Co., Ltd, Seoul, 07281, South Korea.
Meng Y; Division of Advanced Materials Engineering, Jeonbuk National University, Jeonju, 54896, South Korea.
Kim JS; Mechanical Engineering & Materials Science, Washington University in St. Louis, Saint Louis, MO, 63105, USA.
Han S; The Institution of Materials Science & Engineering, Washington University in St. Louis, Saint Louis, MO, 63130, USA.
Xu Z; Mechanical Engineering & Materials Science, Washington University in St. Louis, Saint Louis, MO, 63105, USA.
Lee HE; The Institution of Materials Science & Engineering, Washington University in St. Louis, Saint Louis, MO, 63130, USA.
Kim Y; Division of Advanced Materials Engineering, Jeonbuk National University, Jeonju, 54896, South Korea. haneol@jbnu.ac.kr.
Bae SH; Department of Electrical and Computer Engineering, University of Cincinnati, Cincinnati, OH, 45221, USA. kim4yg@ucmail.uc.edu.

Nano Converg ; 10(1): 20, 2023 Apr 30.

Article em En | MEDLINE | ID: mdl-37120780

Palavras-chave

2DLT; Freestanding membrane; Heterogeneous integration; Remote epitaxy; Van der Waals epitaxy

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Texto completo: 1 Coleções: 01-internacional Base de dados: MEDLINE Idioma: En Revista: Nano Converg Ano de publicação: 2023 Tipo de documento: Article País de afiliação: Estados Unidos

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