RESUMEN
Microsphere photolithography (MPL) is a promising technique for cost-effective fabrication of large-scale metasurfaces. This approach generates an array of photonic jets by the collimated illumination of self-assembled microspheres. The photonic jets can be precisely steered within the unit cell defined by each microsphere by changing the angle of incidence. This allows for the creation of complex metasurface element geometries. Computer controlled articulation of the substrate relative to a static UV source allows the direct-write of different metasurface elements. However, this is time-consuming and requires registration between each exposure for complex features. This paper investigates a single exposure method with the dynamic continuous angle of incidence control provided by a Digital Micromirror Device (DMD) in the front Fourier plane of the projection system. The grayscale values of the DMD pixels can be adjusted to provide optical proximity correction. Larger patterns can be achieved by scanning the substrate relative to the exposure beam. This approach is demonstrated with the creation of hierarchical patterns. This work greatly simplifies the MPL exposure process for complex resonators and provides potential for full light field control.