Dual layer chessboard metasurface sandwiched by a spin-on-carbon for spectral modulation.

Metasurfaces, composed by metals and dielectrics in periodical order with subwavelength pitches, are of great importance for their unique ability to abruptly manipulate optical fields. So far, all the reported metasurfaces are constructed by thermally deposited metals and dielectric films, based on semiconductor processes which are expensive and time-consuming. Inspired by the outstanding dry etch property of spin-on-carbon (SOC) as the interlayer material in CMOS technology, this paper proposes to utilize the SOC as the dielectric layer in a chessboard metasurface with dual layer of gold to form an array of local surface plasmonic resonators (localized surface plasmon resonance). Finite difference and time domain (FDTD) method is used to investigate the spectral characteristics in reflectance of the metasurface in both visible and short wavelengths of infrared light. Electron beam lithography is applied to generate the nanoscale chessboard pattern on ZEP520A, followed by a conventional oxygen-based plasma etch to form high aspect ratio nanopillar arrays in SOC with the feature width under 50 nm, and ended by a thermal deposition of gold to form self-aligned dual layer local surface plasmonic resonators (LSPRs). The measured reflectance spectra agree with the simulated. A wealth of optical properties, such as coupling induced modulations of spectra by LSPRs, are revealed and analyzed. These special modes result in tunable structural colors and wavelength-selective antireflection ability. To the best of our knowledge, this is the first time that SOC is applied in the construction of metasurfaces, which has great potential for next generation nanophotonic devices.

Study of structural effects on the polarization characteristics of subwavelength metallic gratings in short infrared wavelengths.

Applications of subwavelength grating based-polarizers for polarimetric detections are being hindered due to the limited extinction ratio. In this work, the structural effect, including the line edge roughness (LER), of the gratings on the polarizing characteristics was studied by both numerical simulations using finite difference and time domain (FDTD) method and experiments, aiming to figure out the optimal grating profile for achieving high transmittance as well as high extinction ratio. Two different configurations of the gratings, one is dual layer Au lines and the other is parabolic shaped Al lines on structured spin-on-carbon (SOC) films were systematically studied and compared. Nanofabrication of the gratings by electron beam lithography without lift-off process were conducted and optical measurements of their polarization properties demonstrate superior performance of the developed polarizers. The origin of the structural effect was explained by the local surface plasmonic modes, existing in the nano-slits in metallic gratings, which is instructive for further enhancement of the polarization performance.

Spectral filter in short-wave infrareds based on a metasurface on silicon-on-insulator with polarizing bandpass.

Spectral filters with polarimetric character in short-wave infrareds are urgently needed because of their broad applications in optic-fiber communications, polarimetric detections, and imaging. Based on our earlier progress in developing polarimetric devices in infrared wavelengths, in this work, a plasmonic-metasurface-based polarization-dependency multi-channel narrowband filter in short-wave infrareds was developed. To meet the requirement by the developing trend of polarimetric detection/spectral imaging in short-wave infrareds, a resonant cavity in the form of the Au hat/elliptical Si/SiO2 pillars/Au layer as the filters was proposed. Numerical simulations by finite-difference time-domain (FDTD) show resonant and polarized transmissions of the designed devices to infrared light in short wavelengths, and the peak positions are relevant to the structural dimensions. Optical characteristics of the filters, fabricated by electron beam lithography/dry-etch technique, agree well with the simulated behavior. To enhance the transmission efficiency to the applicable level, nanoprocessing of the filters still needs to be optimized. Nevertheless, the progress reported is promising for this new type of spectral filters based on modern metasurfaces.

A Broadband Photoelectronic Detector in a Silicon Nanopillar Array with High Detectivity Enhanced by a Monolayer Graphene.

To meet the fast-growing need for broad applications in remote sensing, novel optoelectronic devices with high detectivity in full bands and room temperature operation are urgently desired. This paper reports our progress in developing a specially designed photovoltaic detector by integrating a monolayer graphene onto a silicon-based nanopillar array standing on a p-n junction. Optoelectronic measurements of the fabricated detectors show that the monolayer graphene plays a critical role in device performance. Compared with the one without the graphene covering, the new device demonstrates significant improvements in the specific detectivity of 1.43 × 1013 Jones and the responsivity exceeding ∼106 V/W with a reduced leakage current corresponding to a quantum efficiency of 74.8% at 860 nm wavelength. Moreover, such sensing performance remained unaffected over the entire band from 450 to 1100 nm at room temperature, which is suitable for broadband imaging applications.

Theoretical modeling of ice lithography on amorphous solid water.

Due to the perfection of the nanofabrication in nanotechnology and nanoscience, ice lithography (IL) by patterning ice thin-films with a focused electron beam, as a significant derivative technology of electron beam lithography (EBL), is attracting growing attention, evoked by its advantages over traditional EBL with respects of in situ-fabrication, high efficiency, high accuracy, limited proximity effect, three-dimensional (3D) profiling capability, etc. However, theoretical modeling of ice lithography for replicated profiles on the ice resist (amorphous solid water, ASW) has rarely been reported so far. As the result, the development of ice lithography still stays at the experimental stage. The shortage of modeling methods limits our insight into the ice lithography capability, as well as theoretical anticipations for future developments of this emerging technique. In this work, an e-beam induced etching ice model based on the Monte Carlo algorithm for point/line spread functions is established to calculate the replicated profiles of the resist by ice lithography. To testify the fidelity of the modeling method, systematic simulations of the ice lithography property under the processing parameters of the resist thickness, electron accelerating voltage and actual patterns are performed. Theoretical comparisons between the IL on ASW and the conventional EBL on polymethyl methacrylate (PMMA) show superior properties of IL over EBL in terms of the minimum feature size, the highest aspect ratio, 3D nanostructure/devices, etc. The success in developing a modeling method for ice lithography, as reported in this paper, offers a powerful tool in characterizing ice lithography up to the theoretical level and down to molecular scales.