Tamper-proof markings for the identification and traceability of high-value metal goods.

A customized UV nanosecond pulsed laser system has been developed for the fast generation of tamper-proof security markings on the surface of metals, such as stainless steel, nickel, brass, and nickel-chromium (Inconel) alloys. The markings in the form of reflective phase holographic structures are generated using a laser microsculpting process that involves laser-induced local melting and vaporization of the metal surface. The holographic structures are formed from an array of optically-smooth craters whose depth can be controlled with ± 25nm accuracy. In contrast to conventional security markings, e.g., engraved serial numbers, etched part numbers and embossed polymer holographic stickers, which are only attached to the metal products as an adhesive tape, the phase holographic structures are robust to local damage (e.g. scratches) and resistant to tampering because they are generated directly on the metal surface. This paper describes a novel laser-based process for security marking of high-value metal goods, investigates the optical performance of the holographic structures, and demonstrates their application to watches.

Direct CO(2) laser-based generation of holographic structures on the surface of glass.

A customized CO(2) laser micromachining system was used for the generation of phase holographic structures directly on the surface of fused silica (HPFS(®)7980 Corning) and Borofloat(®)33 (Schott AG) glass. This process used pulses of duration 10µs and nominal wavelength 10.59µm. The pulse energy delivered to the glass workpiece was controlled by an acousto-optic modulator. The laser-generated structures were optically smooth and crack free. We demonstrated their use as diffractive optical elements (DOEs), which could be exploited as anti-counterfeiting markings embedded into valuable glass-made components and products.

Synthesis and Hydrolytic Studies on the Air-Stable [(4-CN-PhO)(E)P(µ-N(t)Bu)]2 (E = O, S, and Se) Cyclodiphosphazanes.

Reaction of 4-CN-PhOH with [ClP(µ-N(t)Bu)]2 (1) (2:1 ratio) in the presence of Et3N produced the functionalized cyclodiphosph(III/III)azane [(4-CN-PhO)P(µ-N(t)Bu)]2 (2). Oxidation of 2 produced cyclodiphosph(V/V)azanes [(4-CN-PhO)(E)P(µ-N(t)Bu)]2 [E = O (3), S (4), and Se (5)]. This is the first example of a series of cyclodiphosph(V/V)azane derivatives obtained from a single cyclophosph(III/III)azane precursor where all the accessible chalcogen oxidized products are air-stable over prolonged periods of time.