Harnessing a Quantum Design Approach for Making Low-Loss Superlenses.

Recently, so-called "superlenses", made from metamaterials that are structured on a length scale much less than an optical wavelength, have shown impressive diffraction-beating image resolution, but they use materials with negative dielectric responses, and they absorb much of the light in a way that seriously degrades both the resolution and brightness of the image. Here we demonstrate an alternative "quantum metamaterials" (QM) approach that uses materials structured at the nanoscale, i.e., comparable to an electron wavelength. This allows us to use quantum mechanical design principles to generate structures with a highly elliptical isofrequency dispersion characteristic that circumvents this loss problem. The physics of the loss improvement is analyzed analytically and the QM superlens subdiffraction imaging is modeled numerically, with a finite-element method. Finally, we demonstrate a working QM superlens device, utilizing intersubband transitions between the confined electron states in a III-V semiconductor multiquantum-well. It images down to a resolution of better than ∼ λ/10 and has loss figures improved by roughly a decade over previous "classical" designs. This QM approach is an alternative paradigm for designing radiation-manipulating devices and offers the prospect of practical super-resolving devices at new wavelengths and geometries.

Spider Silk: Mother Nature's Bio-Superlens.

It was recently discovered that transparent microspheres and cylinders can function as a super-resolution lens (i.e., superlens) to focus light beyond the diffraction limit. A number of high-resolution applications based on these lenses have been successfully demonstrated and span nanoscopy, imaging, and spectroscopy. Fabrication of these superlenses, however, is often complex and requires sophisticated engineering processes. Clearly an easier model candidate, such as a naturally occurring superlens, is highly desirable. Here, we report for the first time a biological superlens provided by nature: the minor ampullate spider silk spun from the Nephila spider. This natural biosuperlens can distinctly resolve 100 nm features under a conventional white-light microscope with peak wavelength at 600 nm, attaining a resolution of λ/6 that is well beyond the classical limit. Thus, our work opens a new door to develop biology-based optical systems that may provide a new solution to integrating optics in biological systems.

Plasmonic superlensing in doped GaAs.

We demonstrate a semiconductor based broadband near-field superlens in the mid-infrared regime. Here, the Drude response of a highly doped n-GaAs layer induces a resonant enhancement of evanescent waves accompanied by a significantly improved spatial resolution at radiation wavelengths around λ = 20 µm, adjustable by changing the doping concentration. In our experiments, gold stripes below the GaAs superlens are imaged with a λ/6 subwavelength resolution by an apertureless near-field optical microscope utilizing infrared radiation from a free-electron laser. The resonant behavior of the observed superlensing effect is in excellent agreement with simulations based on the Drude-Lorentz model. Our results demonstrate a rather simple superlens implementation for infrared nanospectroscopy.

Acoustic Assembly and Scanning of Superlens Arrays for High-Resolution and Large Field-of-View Bioimaging.

High-resolution and dynamic bioimaging is essential in life sciences and biomedical applications. In recent years, microspheres combined with optical microscopes have offered a low cost but promising solution for super-resolution imaging, by breaking the diffraction barrier. However, challenges still exist in precisely and parallelly superlens controlling using a noncontact manner, to meet the demands of large-area scanning imaging for desired targets. This study proposes an acoustic wavefield-based strategy for assembling and manipulating micrometer-scale superlens arrays, in addition to achieving on-demand scanning imaging through phase modulation. In experiments, acoustic pressure nodes are designed to be comparable in size to microspheres, allowing spatially dispersed microspheres to be arranged into arrays with one unit per node. Droplet microlenses with various diameters can be adapted in the array, allowing for a wide range of spacing periods by applying different frequencies. In addition, through the continuous phase shifting in the x and y directions, this acoustic superlens array achieves on-demand moving for the parallel high-resolution virtual image capturing and scanning of nanostructures and biological cell samples. As a comparison, this noncontact and cost-effective acoustic manner can obtain more than ∼100 times the acquisition efficiency of a single lens, holding promise in advancing super-resolution microscopy and subcellular-level bioimaging.

Roadmap on Label-Free Super-Resolution Imaging.

Label-free super-resolution (LFSR) imaging relies on light-scattering processes in nanoscale objects without a need for fluorescent (FL) staining required in super-resolved FL microscopy. The objectives of this Roadmap are to present a comprehensive vision of the developments, the state-of-the-art in this field, and to discuss the resolution boundaries and hurdles which need to be overcome to break the classical diffraction limit of the LFSR imaging. The scope of this Roadmap spans from the advanced interference detection techniques, where the diffraction-limited lateral resolution is combined with unsurpassed axial and temporal resolution, to techniques with true lateral super-resolution capability which are based on understanding resolution as an information science problem, on using novel structured illumination, near-field scanning, and nonlinear optics approaches, and on designing superlenses based on nanoplasmonics, metamaterials, transformation optics, and microsphere-assisted approaches. To this end, this Roadmap brings under the same umbrella researchers from the physics and biomedical optics communities in which such studies have often been developing separately. The ultimate intent of this paper is to create a vision for the current and future developments of LFSR imaging based on its physical mechanisms and to create a great opening for the series of articles in this field.

Rigorous Analysis and Systematical Design of Double-Layer Metal Superlens for Improved Subwavelength Imaging Mediated by Surface Plasmon Polaritons.

A double-layer metal superlens was rigorously analyzed and systematically designed to improve subwavelength imaging ability. It was revealed that transmission properties of the imaging system could be accurately interpreted by the five-layer waveguide mode theory-each amplification peak among the spatial frequency range of evanescent waves was associated with a corresponding surface plasmon polariton (SPP) mode of an insulator-metal-insulator-metal-insulator (IMIMI) structure. On the basis of such physical insight, evanescent waves of higher spatial frequency were effectively amplified via increasing propagation constants of symmetrically coupled short-range SPP (s-SRSPP) and antisymmetrically coupled short-range SPP (a-SRSPP), and evanescent waves of lower spatial frequency were appropriately diminished by approaching to cut off symmetrically coupled long-range SPP (s-LRSPP). A flat and broad optical transfer function of the imaging system was then achieved, and improved subwavelength imaging performance was validated by imaging an ideal thin object of two slits with a 20-nm width distanced by a 20-nm spacer, under 193-nm illumination. The resolution limit of the designed imaging system with double-layer superlens was further demonstrated to be at least ~λ/16 for an isolated two-slit object model. This work provided sound theoretical analysis and a systematic design approach of double-layer metal superlens for near-field subwavelength imaging, such as fluorescent micro/nanoscopy or plasmonic nanolithography.

A slanted-nanoaperture metal lens: subdiffraction-limited focusing of light in the intermediate field region.

Diffraction of light limits the resolution of beam focusing with conventional lenses, as dictated by the Abbe limit, that is, approximately half the wavelength. Numerous techniques have been explored to overcome this limit. One of the most intensively explored approaches is to design a lens that operates in the near-field region, that is, with a focal length on the order of 10 nm, where evanescent fields can carry and project large in-plane wave-vectors (greater than free-space wave-vectors) to a focal plane. From a practical perspective, however, the requirement of such an ultra-short focal length puts too much constraint, since much longer focal length is commonly desired for intermediate or far-field operation. Here we report a method to beat the Abbe limit while operating with focal length greater than wavelength λ. Our approach is to tailor the radiation patterns of nanoaperture transmission by tilting aperture axes away from the surface of a metal film such that each slanted aperture transmits a highly directed, tilt-oriented beam onto a common focal point carrying maximal in-plane wave-vector components. The proposed nanoaperture array lens was fabricated by forming tilted nanoslits in a Ag, Al, or Cr film. We demonstrate minimal spot size of λ/3 (210-nm or 110-nm full-width half-maximum at λ = 633 nm or 325 nm, respectively) with 1-4λ focal length in air, beating the Abbe limit.

Optically Patternable Metamaterial Below Diffraction Limit.

We report an optically patternable metamaterial (OPM) for ultraviolet nanolithography below the diffraction limit. The OPM features monolayered silver nanoislands embedded within a photosensitive polymer by using spin-coating of an ultrathin polymer, oblique angle deposition, and solid-state embedment of silver nanoislands. This unique configuration simultaneously exhibits both negative effective permittivity and high image contrast in the ultraviolet range, which enables the surface plasmon excitation for the clear photolithographic definition of minimum feature size of 70 nm (≲ λ/5) beyond the near-field zone. This new metamaterial provides a new class of photoresist for ultraviolet nanolithography below the diffraction limit.