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Photodegradation of sulfonamide antimicrobial compounds (sulfadiazine, sulfamethizole, sulfamethoxazole and sulfathiazole) in various UV/oxidant systems.
Wu, J T; Wu, C H; Liu, C Y; Huang, W J.
Afiliación
  • Wu JT; Department of Chemical and Materials Engineering, National Kaohsiung University of Applied Sciences, 415 Chien Kung Road, Kaohsiung 807, Taiwan E-mail: wuch@kuas.edu.tw.
  • Wu CH; Department of Chemical and Materials Engineering, National Kaohsiung University of Applied Sciences, 415 Chien Kung Road, Kaohsiung 807, Taiwan E-mail: wuch@kuas.edu.tw.
  • Liu CY; Department of Chemical and Materials Engineering, National Kaohsiung University of Applied Sciences, 415 Chien Kung Road, Kaohsiung 807, Taiwan E-mail: wuch@kuas.edu.tw.
  • Huang WJ; Department of Chemical and Materials Engineering, National Kaohsiung University of Applied Sciences, 415 Chien Kung Road, Kaohsiung 807, Taiwan E-mail: wuch@kuas.edu.tw.
Water Sci Technol ; 71(3): 412-7, 2015.
Article en En | MEDLINE | ID: mdl-25714641

Texto completo: 1 Bases de datos: MEDLINE Asunto principal: Fotólisis / Contaminantes Químicos del Agua / Peróxido de Hidrógeno / Antibacterianos Idioma: En Revista: Water Sci Technol Asunto de la revista: SAUDE AMBIENTAL / TOXICOLOGIA Año: 2015 Tipo del documento: Article

Texto completo: 1 Bases de datos: MEDLINE Asunto principal: Fotólisis / Contaminantes Químicos del Agua / Peróxido de Hidrógeno / Antibacterianos Idioma: En Revista: Water Sci Technol Asunto de la revista: SAUDE AMBIENTAL / TOXICOLOGIA Año: 2015 Tipo del documento: Article