Topcoat-Assisted Perpendicular and Straightly Parallel Coexisting Orientations of Block Copolymer Films.

Jeong, Jiyoung; Ha, Jeong Sook; Lee, Sang-Soo; Son, Jeong Gon

Jeong, Jiyoung; Ha, Jeong Sook; Lee, Sang-Soo; Son, Jeong Gon.

Afiliación

Jeong J; Photo-Electronic Hybrids Research Center, Korea Institute of Science and Technology, 14 gil-5 Hwarangno, Seongbuk-gu, Seoul, 136-791, Republic of Korea.
Ha JS; KU-KIST Graduate School of Converging Science and Technology, Korea University, Seoul, 136-701, Republic of Korea.
Lee SS; KU-KIST Graduate School of Converging Science and Technology, Korea University, Seoul, 136-701, Republic of Korea.
Son JG; Photo-Electronic Hybrids Research Center, Korea Institute of Science and Technology, 14 gil-5 Hwarangno, Seongbuk-gu, Seoul, 136-791, Republic of Korea.

Macromol Rapid Commun ; 36(13): 1261-6, 2015 Jul.

Article en En | MEDLINE | ID: mdl-25867964

Asunto(s)

Dimetilpolisiloxanos/química; Membranas Artificiales; Poliestirenos/química; Polivinilos/química; Acetona/química; Polimerizacion; Propiedades de Superficie; Volatilización

Palabras clave

block copolymer; dewetting; directional alignment; orientation; thin films

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Texto completo: 1 Bases de datos: MEDLINE Asunto principal: Poliestirenos / Polivinilos / Dimetilpolisiloxanos / Membranas Artificiales Idioma: En Revista: Macromol Rapid Commun Año: 2015 Tipo del documento: Article

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