Ge microdisk with lithographically-tunable strain using CMOS-compatible process.
Opt Express
; 23(26): 33249-54, 2015 Dec 28.
Article
en En
| MEDLINE
| ID: mdl-26831991
ABSTRACT
We present germanium microdisk optical resonators under a large biaxial tensile strain using a CMOS-compatible fabrication process. Biaxial tensile strain of ~0.7% is achieved by means of a stress concentration technique that allows the strain level to be customized by carefully selecting certain lithographic dimensions. The partial strain relaxation at the edges of a patterned germanium microdisk is compensated by depositing compressively stressed silicon nitride layer. Two-dimensional Raman spectroscopy measurements along with finite-element method simulations confirm a relatively homogeneous strain distribution within the final microdisk structure. Photoluminescence results show clear optical resonances due to whispering gallery modes which are in good agreement with finite-difference time-domain optical simulations. Our bandgap-customizable microdisks present a new route towards an efficient germanium light source for on-chip optical interconnects.
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MEDLINE
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En
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Opt Express
Asunto de la revista:
OFTALMOLOGIA
Año:
2015
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Article