The oxidation kinetics of thin nickel films between 250 and 500 °C.

Unutulmazsoy, Y; Merkle, R; Fischer, D; Mannhart, J; Maier, J

Unutulmazsoy, Y; Merkle, R; Fischer, D; Mannhart, J; Maier, J.

Afiliación

Unutulmazsoy Y; Max Planck Institute for Solid State Research, 70569, Stuttgart, Germany. r.merkle@fkf.mpg.de.
Merkle R; Max Planck Institute for Solid State Research, 70569, Stuttgart, Germany. r.merkle@fkf.mpg.de.
Fischer D; Max Planck Institute for Solid State Research, 70569, Stuttgart, Germany. r.merkle@fkf.mpg.de.
Mannhart J; Max Planck Institute for Solid State Research, 70569, Stuttgart, Germany. r.merkle@fkf.mpg.de.
Maier J; Max Planck Institute for Solid State Research, 70569, Stuttgart, Germany. r.merkle@fkf.mpg.de.

Phys Chem Chem Phys ; 19(13): 9045-9052, 2017 Mar 29.

Article en En | MEDLINE | ID: mdl-28304039

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Texto completo: 1 Bases de datos: MEDLINE Idioma: En Revista: Phys Chem Chem Phys Asunto de la revista: BIOFISICA / QUIMICA Año: 2017 Tipo del documento: Article País de afiliación: Alemania

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