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Area-Selective Atomic Layer Deposition of In2O3:H Using a µ-Plasma Printer for Local Area Activation.
Mameli, Alfredo; Kuang, Yinghuan; Aghaee, Morteza; Ande, Chaitanya K; Karasulu, Bora; Creatore, Mariadriana; Mackus, Adriaan J M; Kessels, Wilhelmus M M; Roozeboom, Fred.
Afiliación
  • Mameli A; Department of Applied Physics, Eindhoven University of Technology , PO Box 513, 5600 MB Eindhoven, The Netherlands.
  • Kuang Y; Department of Applied Physics, Eindhoven University of Technology , PO Box 513, 5600 MB Eindhoven, The Netherlands.
  • Aghaee M; Department of Applied Physics, Eindhoven University of Technology , PO Box 513, 5600 MB Eindhoven, The Netherlands.
  • Ande CK; Department of Applied Physics, Eindhoven University of Technology , PO Box 513, 5600 MB Eindhoven, The Netherlands.
  • Karasulu B; Department of Applied Physics, Eindhoven University of Technology , PO Box 513, 5600 MB Eindhoven, The Netherlands.
  • Creatore M; Department of Applied Physics, Eindhoven University of Technology , PO Box 513, 5600 MB Eindhoven, The Netherlands.
  • Mackus AJ; Department of Applied Physics, Eindhoven University of Technology , PO Box 513, 5600 MB Eindhoven, The Netherlands.
  • Kessels WM; Department of Applied Physics, Eindhoven University of Technology , PO Box 513, 5600 MB Eindhoven, The Netherlands.
  • Roozeboom F; Department of Applied Physics, Eindhoven University of Technology, PO Box 513, 5600 MB Eindhoven, The Netherlands; Department Thin Film Technology, TNO, High Tech Campus 21, 5656 AE Eindhoven, The Netherlands.
Chem Mater ; 29(3): 921-925, 2017 Feb 14.
Article en En | MEDLINE | ID: mdl-28405058
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Texto completo: 1 Bases de datos: MEDLINE Idioma: En Revista: Chem Mater Año: 2017 Tipo del documento: Article País de afiliación: Países Bajos
Texto completo
Imprimir
XML
PubMed Links
Buscar en Google

Texto completo: 1 Bases de datos: MEDLINE Idioma: En Revista: Chem Mater Año: 2017 Tipo del documento: Article País de afiliación: Países Bajos