Surface Planarization of Low-Temperature Flowable Silicon Oxide for Atomic Layer Deposition Al2O3 Thin Film Encapsulation.

Yong, Sang Heon; Kim, Sun Jung; Chae, Heeyeop.

Afiliación

Yong SH; School of Chemical Engineering, Sungkyunkwan University (SKKU), Suwon, 16419, Republic of Korea.
Kim SJ; School of Chemical Engineering, Sungkyunkwan University (SKKU), Suwon, 16419, Republic of Korea.
Chae H; School of Chemical Engineering, Sungkyunkwan University (SKKU), Suwon, 16419, Republic of Korea.

J Nanosci Nanotechnol ; 19(5): 2882-2887, 2019 May 01.

Article en En | MEDLINE | ID: mdl-30501795

Texto completo: 1 Bases de datos: MEDLINE Idioma: En Revista: J Nanosci Nanotechnol Año: 2019 Tipo del documento: Article

Texto completo: 1 Bases de datos: MEDLINE Idioma: En Revista: J Nanosci Nanotechnol Año: 2019 Tipo del documento: Article